Single- and multi-scan femtosecond laser writing for selective chemical etching of cross section patternable glass micro-channels

2011 ◽  
Vol 106 (1) ◽  
pp. 5-13 ◽  
Author(s):  
Stephen Ho ◽  
Peter R. Herman ◽  
J. Stewart Aitchison
Keyword(s):  
Femtosecond Laser ◽  
Cross Section ◽  
Chemical Etching ◽  
Laser Writing ◽  
Micro Channels ◽  
Selective Chemical ◽  
Selective Chemical Etching

scholarly journals Fabrication of lithium niobate fork grating by laser-writing-induced selective chemical etching

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Tianxin Wang ◽  
Xiaoyi Xu ◽  
Lei Yang ◽  
Shuo Yan ◽  
Xueli Hu ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Chemical Etching ◽  
Domain Walls ◽  
Calcium Titanate ◽  
Laser Writing ◽  
Micro Fabrication ◽  
Crystal Laser ◽  
Local Lattice ◽  
Selective Chemical ◽  
Selective Chemical Etching

Abstract We propose and experimentally demonstrate a laser-writing-induced selective chemical etching (LWISCE) technique for effective micro-fabrication of lithium niobate (LN) crystal. Laser writing of LN crystal produces negative domains and domain walls. Also, it causes local lattice defects, in which the etching rates are significantly increased in comparison to the original LN crystal. In experiment, we use the LWISCE technique to fabricate various fork gratings in an X-cut LN crystal for the generation of vortex beams. In comparison to etching an untreated X-cut LN crystal, the etching rates of the laser-writing-induced boundaries and the central laser-irradiated areas are enhanced by a factor of 26 and 16, respectively. The width and depth of fork grating structure can be precisely controlled by laser writing parameters. Our method provides an efficient mask-free micro-fabrication technique for LN crystal, which can be readily applied to other ferroelectric crystals such as lithium tantalate, potassium titanyl phosphate and barium calcium titanate.

scholarly journals Three-Dimensional Residue-Free Volume Removal inside Sapphire by High-Temperature Etching aftercmd="newline" Irradiation of Femtosecond Laser Pulses

2008 ◽  
Vol 2008 ◽  
pp. 1-4 ◽  
Author(s):  
Shigeki Matsuo ◽  
Kensuke Tokumi ◽  
Takuro Tomita ◽  
Shuichi Hashimoto
Keyword(s):  
High Temperature ◽  
Femtosecond Laser ◽  
Chemical Etching ◽  
Room Temperature ◽  
Three Dimensional ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Etching Technique ◽  
Selective Chemical ◽  
Selective Chemical Etching

We applied the femtosecond laser-assisted etching technique, that is, irradiation of focused femtosecond laser pulses followed by selective chemical etching, to volume removal inside sapphire. At room temperature, volume etching only slightly advanced while residue remained inside the volume. By increasing the etching temperature, complete volume etching without residue was achieved. Complete etching was, however, accompanied by undesirable phenomena of surface pits or cracks, which are expected to be excluded through further improvement of processing.

Fabrication of microchannels in glass using focused femtosecond laser radiation and selective chemical etching

2006 ◽  
Vol 84 (1-2) ◽  
pp. 47-61 ◽  
Author(s):  
C. Hnatovsky ◽  
R.S. Taylor ◽  
E. Simova ◽  
P.P. Rajeev ◽  
D.M. Rayner ◽  
...  
Keyword(s):  
Laser Radiation ◽  
Femtosecond Laser ◽  
Chemical Etching ◽  
Femtosecond Laser Radiation ◽  
Selective Chemical ◽  
Selective Chemical Etching

Scaling properties of a Si surface patterned by selective chemical etching

2004 ◽  
Vol 36 (1-3) ◽  
pp. 353-358 ◽  
Author(s):  
G. Wisz ◽  
T.Ya. Gorbach ◽  
P.S. Smertenko ◽  
A. Blahut ◽  
K. Zembrowska ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Scaling Properties ◽  
Selective Chemical ◽  
Selective Chemical Etching

Fabrication of InP/SiO2/Si Substrate using Ion-Cutting Process and Selective Chemical Etching

2019 ◽  
Vol 6 (1) ◽  
pp. 99-103
Author(s):  
Peng Chen ◽  
Dapeng Xu ◽  
Luke Mawst ◽  
Kimmo Henttinen ◽  
Tommi Suni ◽  
...  
Keyword(s):  
Chemical Etching ◽  
Cutting Process ◽  
Si Substrate ◽  
Selective Chemical ◽  
Selective Chemical Etching
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