Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde

2019 ◽  
Vol 62 (12-16) ◽  
pp. 838-848 ◽  
Author(s):  
Zhihuan Weng ◽  
Francisco Zaera
2012 ◽  
Vol 520 (16) ◽  
pp. 5151-5154 ◽  
Author(s):  
S.K. Hazra ◽  
L. Borgese ◽  
S. Federici ◽  
E. Bontempi ◽  
M. Ferrari ◽  
...  

2020 ◽  
Vol MA2020-02 (23) ◽  
pp. 1694-1694
Author(s):  
Matthew Labbe ◽  
Michael Patrick Clark ◽  
Ken Cadien ◽  
Douglas G Ivey

2020 ◽  
Vol 142 (48) ◽  
pp. 20380-20389
Author(s):  
Ryan A. Hackler ◽  
Riddhish Pandharkar ◽  
Magali S. Ferrandon ◽  
In Soo Kim ◽  
Nicolaas A. Vermeulen ◽  
...  

2018 ◽  
Vol 6 (36) ◽  
pp. 17548-17558 ◽  
Author(s):  
Zhihuan Weng ◽  
Zhi-hui Chen ◽  
Xiangdong Qin ◽  
Francisco Zaera

Mixed oxide surfaces were developed via the atomic layer deposition of a variety of oxide thin films on mesoporous materials.


ACS Catalysis ◽  
2015 ◽  
Vol 5 (2) ◽  
pp. 1344-1352 ◽  
Author(s):  
Troy D. Gould ◽  
Alia M. Lubers ◽  
April R. Corpuz ◽  
Alan W. Weimer ◽  
John L. Falconer ◽  
...  

2020 ◽  
Vol 8 (33) ◽  
pp. 16973-16984 ◽  
Author(s):  
Chao Lin ◽  
Alexandre C. Foucher ◽  
Yichen Ji ◽  
Eric A. Stach ◽  
Raymond J. Gorte

Thin, ∼1 nm films of CaTiO3, SrTiO3, and BaTiO3 were deposited onto MgAl2O4 by Atomic Layer Deposition (ALD) and studied as catalyst supports for Rh.


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