Scalability of dry-etch processing for small unit-cell HgCdTe focal-plane arrays

2003 ◽  
Vol 32 (7) ◽  
pp. 821-826 ◽  
Author(s):  
E. P. G. Smith ◽  
G. M. Venzor ◽  
P. M. Goetz ◽  
J. B. Varesi ◽  
L. T. Pham ◽  
...  
2012 ◽  
Author(s):  
Ashok K. Sood ◽  
Roger E. Welser ◽  
Robert A. Richwine ◽  
Yash R. Puri ◽  
Russell D. Dupuis ◽  
...  

1929 ◽  
Vol 2 (2) ◽  
pp. 285-300
Author(s):  
George L. Clark

Abstract It may be readily admitted that x-ray studies of the problem of polymerization are only in their beginning. Some complexities—as, for example, small unit cell dimensions— have been added, but in general a real contribution has already been made as a basis for further advances, which will come as knowledge of interpretation increases and as experimental technic improves.


2018 ◽  
Vol 135 ◽  
pp. 218-231 ◽  
Author(s):  
Jian-Jun Gou ◽  
Xing-Jie Ren ◽  
Wen-Zhen Fang ◽  
Shuguang Li ◽  
Wen-Quan Tao

1998 ◽  
Vol 58 (7) ◽  
pp. 4102-4110 ◽  
Author(s):  
K. Reuter ◽  
J. A. Vamvakas ◽  
D. K. Saldin ◽  
V. Blum ◽  
M. Ott ◽  
...  
Keyword(s):  

1997 ◽  
Author(s):  
Nanyoung Yoon ◽  
Byunghyuck Kim ◽  
Hee Chul Lee ◽  
Hyungchul Shin ◽  
Choong-Ki Kim

2005 ◽  
Vol 890 ◽  
Author(s):  
Shusen Huang ◽  
Xin Zhang

ABSTRACTIn this paper, a low-temperature surface micromachining module with two sacrificial layers of polyimide is developed for the manufacturing of double-cantilever microbolometer focal plane arrays. The use of spin-on polyimide allows an all-dry final release step overcoming stiction problems often encountered in wet sacrificial etching processes. For the patterning of the polyimide, a plasma-enhanced chemical vapor deposited silicon oxide is employed as a mask layer. Anisotropic etching of both the mask film and the polyimide layer is accomplished by reactive ion etching. After patterning structural layers, sacrificial etching of the polyimide is conducted using an isotropic dry etch process in high-density oxygen plasma.


2009 ◽  
Vol 603 (14) ◽  
pp. 2179-2187 ◽  
Author(s):  
Laurence D. Marks ◽  
Ann N. Chiaramonti ◽  
Fabien Tran ◽  
Peter Blaha
Keyword(s):  

1990 ◽  
Vol 183 ◽  
Author(s):  
John C. Barry

AbstractMost metals have small unit cells, and in small unit-cell materials in low-index zones the strength of the diffracted beams is often greater for lighter metals than it is for heavier metals. The reason for this is that the strong double-diffraction in heavy metals gives rise to weak Bragg diffraction. In this paper it is shown that for small unit-cell materials, light atom precipitates can be easily detected in heavy atom matrices; and that in large unit-cell materials, the breakdown in the weak-phase-object approximation in thick crystals can be used to identify atom type at defects.


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