Effect of Cu Metallic Interlayer Thickness on Optoelectronic Properties of TiO2-Based Multilayers Deposited by DC Pulsed Magnetron Sputtering

2021 ◽  
Author(s):  
A. A. Abd El-Moula ◽  
F. M. El-Hossary ◽  
M. Raaif ◽  
A. Thabet ◽  
M. Abo El-Kassem
Keyword(s):  
Magnetron Sputtering ◽  
Optoelectronic Properties ◽  
Interlayer Thickness ◽  
Pulsed Magnetron

Pulse synchronized substrate bias for the High Power Pulsed Magnetron Sputtering deposition of CrAlN

2021 ◽  
pp. 138792
Author(s):  
K. Bobzin ◽  
T. Brögelmann ◽  
N.C. Kruppe ◽  
M. Engels ◽  
C. Schulze
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Substrate Bias ◽  
Sputtering Deposition ◽  
Pulsed Magnetron

Pulsed magnetron sputtering of chromium boride films from loose powder targets

2006 ◽  
Vol 200 (14-15) ◽  
pp. 4166-4173 ◽  
Author(s):  
M. Audronis ◽  
P.J. Kelly ◽  
R.D. Arnell ◽  
A.V. Valiulis
Keyword(s):  
Magnetron Sputtering ◽  
Chromium Boride ◽  
Loose Powder ◽  
Pulsed Magnetron
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