Generation of ultraviolet radiation with wide angular tolerance in cesium lithium borate crystal

Gopal C Bhar; Pathik Kumbhakar; Anil K Chaudhary

doi:10.1007/s12043-000-0071-8

Generation of ultraviolet radiation with wide angular tolerance in cesium lithium borate crystal

Pramana ◽

10.1007/s12043-000-0071-8 ◽

2000 ◽

Vol 55 (3) ◽

pp. 413-421 ◽

Cited By ~ 1

Author(s):

Gopal C Bhar ◽

Pathik Kumbhakar ◽

Anil K Chaudhary

Keyword(s):

Ultraviolet Radiation ◽

Lithium Borate ◽

Borate Crystal

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Picosecond, narrow‐band, widely tunable optical parametric oscillator using a temperature‐tuned lithium borate crystal

Applied Physics Letters ◽

10.1063/1.108657 ◽

1993 ◽

Vol 62 (13) ◽

pp. 1457-1459 ◽

Cited By ~ 27

Author(s):

H. Zhou ◽

J. Zhang ◽

T. Chen ◽

C. Chen ◽

Y. R. Shen

Keyword(s):

Optical Parametric Oscillator ◽

Narrow Band ◽

Parametric Oscillator ◽

Lithium Borate ◽

Borate Crystal ◽

Optical Parametric

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Tunable mid-infrared generation in cesium lithium borate crystal

Optics Communications ◽

10.1016/s0030-4018(00)01165-2 ◽

2001 ◽

Vol 188 (5-6) ◽

pp. 371-375 ◽

Cited By ~ 3

Author(s):

U Chatterjee ◽

P Kumbhakar ◽

A.K Chaudhary ◽

G.C Bhar

Keyword(s):

Lithium Borate ◽

Mid Infrared ◽

Borate Crystal

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Growth of large cesium lithium borate crystal and its application for ultraviolet light generation

Technical Digest. CLEO/Pacific Rim'95. The Pacific Rim Conference on Lasers and Electro-Optics ◽

10.1109/cleopr.1995.521328 ◽

2005 ◽

Author(s):

Y. Mori ◽

I. Kuroda ◽

S. Nakajima ◽

K. Nishijima ◽

T. Sasaki ◽

...

Keyword(s):

Ultraviolet Light ◽

Lithium Borate ◽

Borate Crystal ◽

Light Generation

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Noncollinear ultraviolet generation in a lithium borate crystal

Applied Physics B Photophysics and Laser Chemistry ◽

10.1007/bf00357387 ◽

1993 ◽

Vol 57 (6) ◽

pp. 431-434 ◽

Cited By ~ 10

Author(s):

G. C. Bhar ◽

P. K. Datta ◽

A. M. Rudra

Keyword(s):

Lithium Borate ◽

Borate Crystal

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Applications of Photoelectron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100092499 ◽

1976 ◽

Vol 34 ◽

pp. 506-507

Author(s):

William J. Baxter

Keyword(s):

Electron Microscopy ◽

Thermal Decomposition ◽

Chemical Composition ◽

Ultraviolet Radiation ◽

Thin Layer ◽

Edge Effects ◽

Electron Optics ◽

Surface Layers ◽

Crystalline Orientation ◽

Fluorescent Screen

In this form of electron microscopy, photoelectrons emitted from a metal by ultraviolet radiation are accelerated and imaged onto a fluorescent screen by conventional electron optics. image contrast is determined by spatial variations in the intensity of the photoemission. The dominant source of contrast is due to changes in the photoelectric work function, between surfaces of different crystalline orientation, or different chemical composition. Topographical variations produce a relatively weak contrast due to shadowing and edge effects.Since the photoelectrons originate from the surface layers (e.g. ∼5-10 nm for metals), photoelectron microscopy is surface sensitive. Thus to see the microstructure of a metal the thin layer (∼3 nm) of surface oxide must be removed, either by ion bombardment or by thermal decomposition in the vacuum of the microscope.

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