Optical and Structural Properties of TiO2 Thin Films Deposited by RF Magnetron Sputtering

Silicon ◽  
2018 ◽  
Vol 11 (3) ◽  
pp. 1247-1252 ◽  
Author(s):  
R. Shakoury ◽  
A. Zarei
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Rf Magnetron Sputtering ◽  
Tio2 Thin Films

Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

2015 ◽  
Vol 120 (2) ◽  
pp. 765-773 ◽  
Author(s):  
M. Sreedhar ◽  
I. Neelakanta Reddy ◽  
Parthasarathi Bera ◽  
D. Ramachandran ◽  
K. Gobi Saravanan ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Reactive Rf Magnetron Sputtering

Sensitivity of ZnO Based NH3 Sensor by RF Magnetron Sputtering

2012 ◽  
Vol 626 ◽  
pp. 168-172
Author(s):  
Samsiah Ahmad ◽  
Nor Diyana Md Sin ◽  
M.N. Berhan ◽  
Mohamad Rusop
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Structural Properties ◽  
Rf Magnetron Sputtering ◽  
Xrd Analysis ◽  
Zno Thin Films ◽  
Rf Power ◽  
Si Substrates

Zinc Oxide (ZnO) thin films were deposited onto SiO2/Si substrates using radio frequency (RF) magnetron sputtering method as an Ammonia (NH3) sensor. The dependence of RF power (50~300 Watt) on the structural properties and sensitivity of NH3sensor were investigated. XRD analysis shows that regardless of the RF power, all samples display the preferred orientation on the (002) plane. The results show that the ZnO deposited at 200 Watt display the highest sensitivity value which is 44%.

Hydrophilicity of TiO2 thin films obtained by RF magnetron sputtering deposition

2006 ◽  
Vol 6 (5) ◽  
pp. 931-933 ◽  
Author(s):  
Xiu-Tian Zhao ◽  
Kenji Sakka ◽  
Naoto Kihara ◽  
Yasuyuki Takata ◽  
Makoto Arita ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Sputtering Deposition
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