In situ examination of anodic silver oxide films by EXAFS in the reflection mode

1995 ◽  
Vol 381 (1-2) ◽  
pp. 113-121 ◽  
Author(s):  
D. Hecht ◽  
P. Borthen ◽  
H.-H. Strehblow
ChemInform ◽  
2010 ◽  
Vol 26 (23) ◽  
pp. no-no
Author(s):  
D. HECHT ◽  
P. BORTHEN ◽  
H.-H. STREHBLOW

2021 ◽  
Vol 286 ◽  
pp. 129234
Author(s):  
Yongli Guo ◽  
Hui Cai ◽  
Zhe Wang ◽  
Xin Wang ◽  
Peng Cao ◽  
...  

1999 ◽  
Vol 567 ◽  
Author(s):  
Masayuki Suzuki ◽  
Yoji Saito

ABSTRACTWe tried direct oxynitridation of silicon surfaces by remote-plasma-exited nitrogen and oxygen gaseous mixtures at 700°C in a high vacuum. The oxynitrided surfaces were investigated with in-situ X-ray photoelectron spectroscopy. With increase of the oxynitridation time, the surface density of nitrogen gradually increases, but that of oxygen shows nearly saturation behavior after the rapid increase in the initial stage. We also annealed the grown oxynitride and oxide films to investigate the role of the contained nitrogen. The desorption rate of oxygen from the oxynitride films is much less than that from oxide films. We confirmed that nitrogen stabilizes the thermal stability of these oxynitride films.


1997 ◽  
Vol 7 (C2) ◽  
pp. C2-717-C2-722 ◽  
Author(s):  
D. Hecht ◽  
P. Borthen ◽  
R. Frahm ◽  
H.-H. Strehblow

1995 ◽  
Vol 81 (6) ◽  
pp. 607-612 ◽  
Author(s):  
Takayuki NARUSHIMA ◽  
Naoki KIKUCHI ◽  
Makoto MARUYAMA ◽  
Haruo ARASHI ◽  
Yuichiro NISHINA ◽  
...  

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