Sputter growth and chemical analysis by X-ray photoelectron spectroscopy/electron spectroscopy of an InSe thin film

1980 ◽  
Vol 69 (1) ◽  
pp. L5-L8 ◽  
Author(s):  
A.J. McEvoy ◽  
A. Parkes ◽  
K. Solt ◽  
R. Bichsel
Keyword(s):  
Thin Film ◽  
Chemical Analysis ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
X Ray

Uniform Depth Profiling in X-ray Photoelectron Spectroscopy (Electron Spectroscopy for Chemical Analysis)

1978 ◽  
Vol 32 (2) ◽  
pp. 175-177 ◽  
Author(s):  
L. Bradley ◽  
Y. M. Bosworth ◽  
D. Briggs ◽  
V. A. Gibson ◽  
R. J. Oldman ◽  
...  
Keyword(s):  
Chemical Analysis ◽  
Auger Electron Spectroscopy ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Depth Profiling ◽  
Ion Source ◽  
X Ray ◽  
Nitride Oxide ◽  
Silicon Device

The difficulties of nonuniform ion etching which hamper depth profiling by X-ray photoelectron spectroscopy (XPS) have been overcome by use of a mechanically scanned saddle-field ion source. The system and its calibration for uniformity are described, and its performance is illustrated by the depth profile of a Si3N4/SiO2/Si metal nitride oxide silicon device. This also allows the potential advantages of XPS profiling over Auger electron spectroscopy profiling to be discussed.

Adhesive Bonding of Various Materials to Hard Tooth Tissues. XIV. Enamel Mordant Selection Assisted by ESCA (XPS)

1978 ◽  
Vol 57 (4) ◽  
pp. 551-556 ◽  
Author(s):  
R.L. Bowen
Keyword(s):  
Chemical Analysis ◽  
Phosphoric Acid ◽  
Surface Analysis ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Adhesive Bonding ◽  
Acid Etching ◽  
Etching Solution ◽  
X Ray

Surface analysis by XPS (X-ray photoelectron spectroscopy), also called ESCA (electron spectroscopy for chemical analysis), indicates that only certain cations are appreciably sorbed by enamel from an acid etching solution containing phosphoric acid and equimolar concentrations of candidate mordant salts.

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