941. An improved electron bombardment evaporation source for powdered materials

AbstractUsing a new ID hybrid model of the electron bombardment in flare loops, we study not only the evolution of densities, plasma velocities and temperatures in the loop, but also the temporal and spatial evolution of hard X-ray emission. In the present paper a continuous bombardment by electrons isotropically accelerated at the top of flare loop with a power-law injection distribution function is considered. The computations include the effects of the return-current that reduces significantly the depth of the chromospheric layer which is evaporated. The present modelling is made with superthermal electron parameters corresponding to the classical resistivity regime for an input energy flux of superthermal electrons of 109erg cm−2s−1. It was found that due to the electron bombardment the two chromospheric evaporation waves are generated at both feet of the loop and they propagate up to the top, where they collide and cause temporary density and hard X-ray enhancements.

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Resistance Monitor and Control for Vacuum Evaporation of Metals and Carbon

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100092827 ◽

1976 ◽

Vol 34 ◽

pp. 572-573

Author(s):

Russell L. Steere ◽

Eric F. Erbe ◽

J. Michael Moseley

Keyword(s):

Electronic Device ◽

Point Sources ◽

High Contrast ◽

Variable Resistor ◽

Quality Of Results ◽

Low Contrast ◽

Evaporation Source ◽

And Control ◽

At Will

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.

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