The critical current density distribution in a TIBaCaCuO thin film ring resonator

1994 ◽  
Vol 235-240 ◽  
pp. 3073-3074
Author(s):  
Y.J. Feng ◽  
Q.H. Cheng ◽  
P.H. Wu ◽  
H.M. Liu ◽  
X.X. Yao ◽  
...  
Keyword(s):  
Thin Film ◽  
Critical Current Density ◽  
Density Distribution ◽  
Critical Current ◽  
Current Density ◽  
Ring Resonator ◽  
Current Density Distribution

The critical current density distribution in a TlBaCaCuO thin film ring resonator

1994 ◽  
Vol 92 (5) ◽  
pp. 375-376
Author(s):  
Y.J. Feng ◽  
Q.H. Cheng ◽  
P.H. Wu ◽  
H.M. Liu ◽  
S.L. Yan ◽  
...  
Keyword(s):  
Thin Film ◽  
Critical Current Density ◽  
Density Distribution ◽  
Critical Current ◽  
Current Density ◽  
Ring Resonator ◽  
Current Density Distribution

Critical current density distribution in the superconducting oxide layer of pre-annealing and intermediate-rolling processed composite tapes

1998 ◽  
Vol 11 (11) ◽  
pp. 1237-1240 ◽  
Author(s):  
Yoshimitsu Hishinuma ◽  
Hitoshi Kitaguchi ◽  
Hanping Miao ◽  
Hiroaki Kumakura ◽  
Kikuo Itoh ◽  
...  
Keyword(s):  
Critical Current Density ◽  
Density Distribution ◽  
Oxide Layer ◽  
Critical Current ◽  
Current Density ◽  
Current Density Distribution

Critical current density distribution in superconducting oxide layer of Bi2Sr2CaCu2Ox/Ag composite tapes

1998 ◽  
Vol 301 (1-2) ◽  
pp. 111-115 ◽  
Author(s):  
Hitoshi Kitaguchi ◽  
Hanping Miao ◽  
Hiroaki Kumakura ◽  
Kazumasa Togano ◽  
Bernard Chenevier
Keyword(s):  
Critical Current Density ◽  
Density Distribution ◽  
Oxide Layer ◽  
Critical Current ◽  
Current Density ◽  
Current Density Distribution

Microstructural characterization of YBa2Cu3O7-x thin films formed by metalorganic CVD

1991 ◽  
Vol 49 ◽  
pp. 1080-1081
Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Film Growth ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Ion Milling ◽  
Conventional Grinding

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.

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