scholarly journals Direct determination of impurities in high purity silicon carbide by inductively coupled plasma optical emission spectrometry using slurry nebulization technique

2006 ◽  
Vol 577 (2) ◽  
pp. 288-294 ◽  
Author(s):  
Zheng Wang ◽  
Deren Qiu ◽  
Zheming Ni ◽  
Guangyi Tao ◽  
Pengyuan Yang
Keyword(s):  
Inductively Coupled Plasma ◽  
Direct Determination ◽  
Optical Emission ◽  
Emission Spectrometry ◽  
Inductively Coupled ◽  
High Purity Silicon ◽  
Plasma Optical Emission Spectrometry ◽  
Slurry Nebulization ◽  
Determination Of Impurities

Direct determination of trace impurities in high-purity silicon nitride by axial viewed inductively coupled plasma optical emission spectrometry using a slurry nebulization technique

2015 ◽  
Vol 30 (4) ◽  
pp. 909-915 ◽  
Author(s):  
Zheng Wang ◽  
Junye Zhang ◽  
Guoxia Zhang ◽  
Deren Qiu ◽  
Pengyuan Yang
Keyword(s):  
Silicon Nitride ◽  
High Purity ◽  
Inductively Coupled Plasma ◽  
Direct Determination ◽  
Optical Emission ◽  
Emission Spectrometry ◽  
Trace Impurities ◽  
High Purity Silicon ◽  
Slurry Nebulization

A simple, rapid and reliable method was developed for the determination of trace impurities in high-purity silicon nitride (nm- and μm-sized) by ICP-OES using a slurry nebulization technique.

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