Direct determination of trace impurities in high-purity silicon nitride by axial viewed inductively coupled plasma optical emission spectrometry using a slurry nebulization technique
2015 ◽
Vol 30
(4)
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pp. 909-915
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Keyword(s):
A simple, rapid and reliable method was developed for the determination of trace impurities in high-purity silicon nitride (nm- and μm-sized) by ICP-OES using a slurry nebulization technique.
2006 ◽
Vol 577
(2)
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pp. 288-294
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2011 ◽
2005 ◽
Vol 60
(5)
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pp. 567-573
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2015 ◽
2015 ◽
1993 ◽
Vol 8
(3)
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pp. 481
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2006 ◽
Vol 21
(2)
◽
pp. 28-32
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2006 ◽
Vol 41
(10)
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pp. 1378-1385
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