Cell patterning using molecular vapor deposition of self-assembled monolayers and lift-off technique

2011 ◽  
Vol 7 (3) ◽  
pp. 1094-1103 ◽  
Author(s):  
Gaoshan Jing ◽  
Yu Wang ◽  
Tianyi Zhou ◽  
Susan F. Perry ◽  
Michael T. Grimes ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Cell Patterning ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Lift Off

scholarly journals Protein resistant oligo(ethylene glycol) terminated self-assembled monolayers of thiols on gold by vapor deposition in vacuum

2010 ◽  
Vol 5 (2) ◽  
pp. 30-36 ◽  
Author(s):  
Laxman Kankate ◽  
Udo Werner ◽  
Andrey Turchanin ◽  
Armin Gölzhäuser ◽  
Helge Großmann ◽  
...  
Keyword(s):  
Ethylene Glycol ◽  
Vapor Deposition ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Protein Resistant

scholarly journals Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

2012 ◽  
Vol 3 ◽  
pp. 101-113 ◽  
Author(s):  
Zhe She ◽  
Andrea DiFalco ◽  
Georg Hähner ◽  
Manfred Buck
Keyword(s):  
Electron Beam ◽  
Copper Surface ◽  
Self Assembled Monolayers ◽  
Metal Structures ◽  
Step Procedure ◽  
Assembled Monolayers ◽  
Polycrystalline Gold ◽  
Self Assembled ◽  
Lift Off ◽  
Surface Morphologies

Self-assembled monolayers (SAMs) of 4'-methylbiphenyl-4-thiol (MBP0) adsorbed on polycrystalline gold substrates served as templates to control electrochemical deposition of Cu structures from acidic solution, and enabled the subsequent lift-off of the metal structures by attachment to epoxy glue. By exploiting the negative-resist behaviour of MBP0, the SAM was patterned by means of electron-beam lithography. For high deposition contrast a two-step procedure was employed involving a nucleation phase around −0.7 V versus Cu2+/Cu and a growth phase at around −0.35 V versus Cu2+/Cu. Structures with features down to 100 nm were deposited and transferred with high fidelity. By using substrates with different surface morphologies, AFM measurements revealed that the roughness of the substrate is a crucial factor but not the only one determining the roughness of the copper surface that is exposed after lift-off.

Vapor deposition of amino-functionalized self-assembled monolayers on MEMS

2003 ◽  
Author(s):  
Matthew G. Hankins ◽  
Paul J. Resnick ◽  
Peggy J. Clews ◽  
Thomas M. Mayer ◽  
David R. Wheeler ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Dependence of deposition method on the molecular structure and stability of organosilanes revealed from degrafting by tetrabutylammonium fluoride

2020 ◽  
Vol 22 (2) ◽  
pp. 658-666
Author(s):  
Jason Miles ◽  
Yeongun Ko ◽  
Jan Genzer
Keyword(s):  
Molecular Structure ◽  
Vapor Deposition ◽  
Self Assembled Monolayers ◽  
Deposition Method ◽  
Structure And Stability ◽  
Tetrabutylammonium Fluoride ◽  
Assembled Monolayers ◽  
Self Assembled

We probe the structure of self-assembled monolayers comprising organosilanes on flat silica-based surfaces prepared by liquid and vapor deposition by removing the organosilane molecules gradually from the substrate via tetrabutylammonium fluoride.

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