In situ measurement of the surface stress evolution during magnetron sputter-deposition of Ag thin film

2007 ◽  
Vol 253 (23) ◽  
pp. 9112-9115 ◽  
Author(s):  
Seung Hyun Lee ◽  
Joong Keun Park
Keyword(s):  
Thin Film ◽  
Surface Stress ◽  
Sputter Deposition ◽  
In Situ Measurement ◽  
Stress Evolution ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Ge2Sb2Te5 Film Deposition and Properties

2007 ◽  
Vol 997 ◽  
Author(s):  
Mengqi Ye ◽  
Rong Tao ◽  
Peijun Ding ◽  
Abner Bello
Keyword(s):  
Thermal Control ◽  
Sputter Deposition ◽  
Film Deposition ◽  
Strong Impact ◽  
Film Properties ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Sputtering Pressure

AbstractMagnetron sputter deposition of Ge2Sb2Te5 film is presented. Good thermal control of the wafer is found critical for maintaining process repeatability. In-situ wafer heating conditions have strong impact on as-deposited Ge2Sb2Te5 film properties such as resistivity, density, stress, composition, and microstructure. The effects of wafer bias and sputtering pressure are also discussed.

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