A Two Magnetron Sputter Deposition Chamber Equipped with an Additional Ion Gun for in situ Observation of Thin Film Growth and Surface Modification by Synchrotron Radiation Scattering

2007 ◽  
Author(s):  
Norbert Schell ◽  
Johannes von Borany ◽  
Jens Hauser
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Sputter Deposition ◽  
Thin Film Growth ◽  
In Situ Observation ◽  
Radiation Scattering ◽  
Deposition Chamber ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

In-situ Observation of Organic Thin Film Growth on Graphene

2013 ◽  
pp. 107-139 ◽  
Author(s):  
Gregor Hlawacek ◽  
Fawad S. Khokhar ◽  
Raoul van Gastel ◽  
Harold J. W. Zandvliet ◽  
Bene Poelsema ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
In Situ Observation ◽  
Organic Thin Film

scholarly journals In-situ Observation of 2-Dimensional X-ray Diffraction of Organic Thin-film Growth by Synchrotron Radiation

Hyomen Kagaku ◽  
2014 ◽  
Vol 35 (4) ◽  
pp. 190-195 ◽  
Author(s):  
Noriyuki YOSHIMOTO ◽  
Takeshi WATANABE ◽  
Tomoyuki KOGANEZAWA ◽  
Mamoru KIKUCHI ◽  
Ichiro HIROSAWA
Keyword(s):  
Thin Film ◽  
Synchrotron Radiation ◽  
Film Growth ◽  
Thin Film Growth ◽  
In Situ Observation ◽  
Organic Thin Film ◽  
X Ray Diffraction ◽  
X Ray

In situ work function study of oxidation and thin film growth on clean surfaces

1999 ◽  
Vol 433-435 ◽  
pp. 770-774 ◽  
Author(s):  
I.D Baikie ◽  
U Petermann ◽  
B Lägel
Keyword(s):  
Thin Film ◽  
Work Function ◽  
Film Growth ◽  
Thin Film Growth ◽  
Function Study

scholarly journals In-Situ Thin Film Growth of PbTiO3 By Multi Target Sputtering

1994 ◽  
Vol 341 ◽  
Author(s):  
Thomas Maeder ◽  
Paul Muralt
Keyword(s):  
Lead Oxide ◽  
Film Growth ◽  
Sputter Deposition ◽  
Dielectric Constants ◽  
Thin Film Growth ◽  
Film Morphology ◽  
Reactive Sputter Deposition ◽  
Pt Electrodes ◽  
Oxide Flux

AbstractThe in-situ reactive sputter deposition of PbTiO3 on Pt/Ti/SiO2/Si from two metallic targets was investigated. A minimal lead oxide flux of two to three times the titanium oxide flux is needed in order to obtain stoichiometric films with the perovskite structure. For higher fluxes, the Pb/Ti ratio in the film stays at the stoichiometric value 1; the orientation changes from random to <100>; and the film morphology transforms from a rough to a smooth polycrystalline film. The obtained dielectric constants vary between 40 and 150, the losses between 2 and 4 % (10 kHz). The method could be extended to PbZrxTi1-xO3 for x ≤0.7. The orientation is lost when the Pt electrodes are replaced by RuO2 electrodes.

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