Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

2020 ◽  
Vol 508 ◽  
pp. 145186
Author(s):  
Bo Li ◽  
Chunyuan Hou ◽  
Chengxiang Tian ◽  
Jianlei Guo ◽  
Xia Xiang ◽  
...  
2013 ◽  
Vol 21 (10) ◽  
pp. 12204 ◽  
Author(s):  
Liu Hongjie ◽  
Huang Jin ◽  
Wang Fengrui ◽  
Zhou Xinda ◽  
Ye Xin ◽  
...  

2014 ◽  
Vol 513-517 ◽  
pp. 74-77
Author(s):  
Wei Sun ◽  
Hong Ji Qi ◽  
Zhou Fang ◽  
Zhen Kun Yu ◽  
Hai Yuan Li

Surface and subsurface defects of optics are of major concern in improving laser induced damage threshold. SiO2single layers were fabricated by physical vapor deposition and sol-gel technique on fused silica substrates. HF acid etching and ultrasonic cleaning process are used to investigate the effect of surface and subsurface defects of substrates on the laser induced damage threshold (1-on-1, 8 ns at 355nm). Experimental data are then fitted with the Gaussian model of threshold distribution, which permits to discriminate different kinds of defects and extract their densities and threshold distribution. The interpretation of these data is further discussed according to their cleaning and fabrication method.


Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1233
Author(s):  
Mingjie Deng ◽  
Ci Song ◽  
Feng Shi ◽  
Wanli Zhang ◽  
Ye Tian ◽  
...  

The magnetorheological (MR) repair method can effectively repair the small-scale damage of fused silica optics and further improve the laser-induced damage threshold of fused silica optics. However, at present, the rules of MR repair of small-scale damage of fused silica are not clear and cannot provide further guidance for the repair process. In this paper, the fused silica damage samples were repaired layer by layer by the MR method. The number and size changes of all the surface damage, the morphology, the fluorescence area distribution, and photothermal-absorption value of a single typical small-scale damage were measured. Through dark field scattering imaging, it is found that when the repair depth is 5 μm, the repair completion rate of damage with a transverse size less than 50 μm can reach 44%, and the repair efficiency decreases gradually with the repair process. Focusing on the whole repair process of a single typical, small-scale damage—due to the flexible shear removal mechanism of the MR method—the repair process of damage can be divided into three stages, which as a whole is a top-down, from outside to inside process. The first stage is the process of removing the surface of the damage layer by layer. In this process, MR fluid will introduce pollution to the inside of the damage. In the second stage, MR fluid begins to repair the inside of the damage. In the third stage, the MR ribbon completely covers the inside of the damage, and the repair effect is the most obvious. The measurement results of photothermal absorption and fluorescence area distribution of damage confirm this process. The photothermal absorption value and fluorescence area distribution of damage do not simply decrease with the repair process. On the contrary, they gradually increase first, and then decrease significantly when the damage depth reaches less than 1 μm. As the thickness of the MR ribbon is 1 μm, the reduction in the photothermal absorption value and fluorescence area of the damage is due to the process of repairing the inside of the damage. The results show that the absorbent impurities inside the small-scale damage of fused silica are the main factor affecting the performance. The key to repairing the small-scale damage of fused silica by the MR method is that the damaged interior must be repaired effectively. This paper outlines the MR repair method of small-scale damage of fused silica, which is of great significance to optimize the MR repair process.


1998 ◽  
Author(s):  
Alberto Salleo ◽  
Francois Y. Genin ◽  
J. M. Yoshiyama ◽  
Christopher J. Stolz ◽  
Mark R. Kozlowski

2017 ◽  
Vol 25 (23) ◽  
pp. 29260 ◽  
Author(s):  
Mingjin Xu ◽  
Feng Shi ◽  
Lin Zhou ◽  
Yifan Dai ◽  
Xiaoqiang Peng ◽  
...  

2009 ◽  
Vol 29 (3) ◽  
pp. 756-760 ◽  
Author(s):  
唐顺兴 Tang Shunxing ◽  
欧阳小平 Ouyang Xiaoping ◽  
朱宝强 Zhu Baoqiang ◽  
林尊琪 Lin Zunqi

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