Facile fabrication of ZnAl layered double hydroxide film co-intercalated with vanadates and laurates by one-step post modification

2021 ◽  
Vol 40 ◽  
pp. 100351
Author(s):  
Yanhui Cao ◽  
Shaoqiang Jin ◽  
Dajiang Zheng ◽  
Changjian Lin
2021 ◽  
Author(s):  
Zihao Liu ◽  
Shifeng Li ◽  
Fangfang Wang ◽  
Mingxia Li ◽  
Yonghong Ni

FeNi-layered double hydroxide (LDH) is thought to be an excellent electrocatalyst for oxygen evolution reaction (OER), but it always shows extremely poor electrocatalytic activity toward hydrogen evolution reaction (HER) in...


ChemInform ◽  
2004 ◽  
Vol 35 (51) ◽  
Author(s):  
Alexey V. Lukashin ◽  
Andrei A. Eliseev ◽  
Natalya G. Zhuravleva ◽  
Alexey A. Vertegel ◽  
Yuri D. Tretyakov ◽  
...  

2013 ◽  
Vol 3 (1) ◽  
pp. C9-C11 ◽  
Author(s):  
A. N. Salak ◽  
A. D. Lisenkov ◽  
M. L. Zheludkevich ◽  
M. G. S. Ferreira

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
D. Scarpellini ◽  
C. Leonardi ◽  
A. Mattoccia ◽  
L. Di Giamberardino ◽  
P. G. Medaglia ◽  
...  

We have grown nanostructured films of Zn/Al Layered Double Hydroxide (LDH) on different substrates by combining the deposition of an aluminum micropatterned thin layer with a successive one-step room-temperature wet-chemistry process. The resulting LDH film is made of lamellar-like nanoplatelets mainly oriented perpendicular to the substrate. Since the aluminum layer acts as both reactant and seed for the synthesis of the LDH, the growth can be easily confined with submicrometric-level resolution (about ±0.5 μm) by prepatterning the aluminum layer with conventional photolithographic techniques. Moreover, we demonstrate real-time monitoring of the LDH growth process by simply measuring the resistance of the residual aluminum film. If the aluminum layer is thinner than 250 nm, the morphology of LDH nanoplatelets is less regular and their final thickness linearly depends on the initial amount of aluminum. This peculiarity allows accurately controlling the LDH nanoplatelet thickness (with uncertainty of about ±10%) by varying the thickness of the predeposited aluminum film. Since the proposed growth procedure is fully compatible with MEMS/CMOS technology, our results may be useful for the fabrication of micro-/nanodevices.


2013 ◽  
Vol 1 (6) ◽  
pp. 1963-1968 ◽  
Author(s):  
Juan Yang ◽  
Chang Yu ◽  
Xiaoming Fan ◽  
Zheng Ling ◽  
Jieshan Qiu ◽  
...  

2010 ◽  
Vol 39 (6) ◽  
pp. 588-590 ◽  
Author(s):  
Fazhi Zhang ◽  
Yaru Xie ◽  
Sailong Xu ◽  
Xiaofei Zhao ◽  
Xiaodong Lei

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