Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc, plasma enhanced CVD and unbalanced magnetron sputtering
2004 ◽
Vol 13
(4-8)
◽
pp. 1346-1349
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2006 ◽
Vol 201
(1-2)
◽
pp. 157-163
◽
2009 ◽
Vol 3
(2)
◽
pp. 336-346
◽
2017 ◽
Vol 17
(11)
◽
pp. 7874-7878
2017 ◽
Vol 422
◽
pp. 921-931
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