Role of crystallographic orientation on intragranular void growth in polycrystalline FCC materials

2021 ◽  
pp. 103104
Author(s):  
Paul G. Christodoulou ◽  
Sylvain Dancette ◽  
Ricardo A. Lebensohn ◽  
Eric Maire ◽  
Irene J. Beyerlein
Keyword(s):  
Void Growth ◽  
Crystallographic Orientation ◽  
Fcc Materials

scholarly journals Influence of crystallographic orientation on the void growth at the grain boundaries in bi-crystals

2020 ◽  
Author(s):  
GUADALUPE VADILLO
Keyword(s):  
Grain Boundary ◽  
Representative Volume Element ◽  
Void Growth ◽  
Crystallographic Orientation ◽  
Stress Triaxiality ◽  
Volume Element ◽  
Lattice Rotation ◽  
Lode Parameter ◽  
Representative Volume ◽  
The Impact

Void growth and morphology evolution in fcc bi-crystals are investigated using crystal plasticity fi?nite element method. For that purpose, representative volume element of bi-crystals with a void at the grain boundary are considered in the analysis. Grain boundary is assumed initially perpendicular/coaxial with the straight sides of the cell. Fully periodic boundary conditions are prescribed in the representative volume element and macroscopic stress triaxiality and Lode parameter are kept constant during the whole deformation process. Three di?erent pairs of crystal orientations characterized as hard-hard, soft-soft and soft-hard has been employed for modellingthe mechanical response of the bi-crystal. Simulations are performed to study the implications of triaxiality, Lode parameter and crystallographic orientation on slip mechanism, hardening and hence void evolution. The impact of void presence and its growth on the heterogeneity of lattice rotation and resulting grain fragmentation in neighbouring areas is also analysed and discussed.

Vacuum‐Deposited Gold Films: II . Role of the Crystallographic Orientation of Oxide‐Covered Silicon Substrates

1995 ◽  
Vol 142 (5) ◽  
pp. 1629-1633 ◽  
Author(s):  
Yuval Golan ◽  
Lev Margulis ◽  
Sophie Matlis ◽  
Israel Rubinstein
Keyword(s):  
Crystallographic Orientation ◽  
Silicon Substrates ◽  
Gold Films
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