Influence of rotational speed, angle of impingement, concentration of slurry and exposure time on erosion performance of HVOF sprayed cermet coatings on 35CrMo steel

2021 ◽  
Author(s):  
Daniel C. Ribu ◽  
R. Rajesh ◽  
D. Thirumalaikumarasamy ◽  
S. Vignesh
Keyword(s):  
Exposure Time ◽  
Rotational Speed ◽  
Cermet Coatings ◽  
35Crmo Steel

scholarly journals Thermal Cycles and Deformation Characters During High-Speed Micro Friction Stir Welding Process of AA7075-T6 Sheets

Metals ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 1236
Author(s):  
Ni ◽  
Mao ◽  
Qin ◽  
Xiao ◽  
Fu
Keyword(s):  
Elevated Temperature ◽  
Friction Stir Welding ◽  
Exposure Time ◽  
Welding Speed ◽  
Rotational Speed ◽  
High Speed ◽  
Peak Temperature ◽  
Friction Stir ◽  
Backing Plate ◽  
Temperature Exposure

Thermal cycles and deformations during high-speed micro friction stir welding (μFSW) under different welding conditions were studied by experimental methods. The results show that the peak temperature and elevated-temperature exposure time (t150) increased with the increasing of rotational speed and decreased with the increasing of welding speed. Increasing rotational speed or welding speed led to an increase in both heating and cooling rates. The joint fabricated by the pinless tool experienced a lower peak temperature, a shorter elevated-temperature exposure time, and a larger temperature gradient than that by the pin tool. The welded sheet presented an anti-saddle deformation character, with convex bending in a longitudinal direction and concave angular bending in a transverse direction. In comparison to the pin tool, the longitudinal maximum bending deformation, Zmax, of the joint fabricated by the pinless tool was reduced by 12.35%, and the transverse angular deformation, α, was reduced by 6.67%. In comparison to the steel backing plate, the Zmax of the joint produced using a copper backing plate was reduced by 40.66%, but the α was increased by 53.27%.

Progress In The Practical Application Of Automated Image Analysis To Tem Negatives

1977 ◽  
Vol 35 ◽  
pp. 214-217
Author(s):  
F. A. Heckman ◽  
E. Redman ◽  
J.E. Connolly
Keyword(s):  
Image Analysis ◽  
Image Quality ◽  
Exposure Time ◽  
Image Contrast ◽  
Automated Image Analysis ◽  
Practical Application ◽  
Factors Affecting ◽  
High Image Quality ◽  
Qualitative Evidence ◽  
Comprehensive Study

In our initial publication on this subject1) we reported results demonstrating that contrast is the most important factor in producing the high image quality required for reliable image analysis. We also listed the factors which enhance contrast in order of the experimentally determined magnitude of their effect. The two most powerful factors affecting image contrast attainable with sheet film are beam intensity and KV. At that time we had only qualitative evidence for the ranking of enhancing factors. Later we carried out the densitometric measurements which led to the results outlined below.Meaningful evaluations of the cause-effect relationships among the considerable number of variables in preparing EM negatives depend on doing things in a systematic way, varying only one parameter at a time. Unless otherwise noted, we adhered to the following procedure evolved during our comprehensive study:Philips EM-300; 30μ objective aperature; magnification 7000- 12000X, exposure time 1 second, anti-contamination device operating.

Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

1978 ◽  
Vol 36 (1) ◽  
pp. 292-293 ◽  
Author(s):  
K. Izui ◽  
T. Nishida ◽  
S. Furuno ◽  
H. Otsu ◽  
S. Kuwabara
Keyword(s):  
Radiation Damage ◽  
Exposure Time ◽  
Gaussian Distribution ◽  
Intensity Distribution ◽  
Chromatic Aberration ◽  
Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

Corrosion. Corrosion Behavior of Thermal Sprayed Carbide Cermet Coatings.

1995 ◽  
Vol 44 (506) ◽  
pp. 1332-1337
Author(s):  
Mitsuharu INABA ◽  
Kazumi TANI ◽  
Tomoki TOMITA ◽  
Yasuyuki TAKATANI ◽  
Yoshio HARADA
Keyword(s):  
Corrosion Behavior ◽  
Cermet Coatings

Methods of experimental polyploidization and their use in apple breeding

2020 ◽  
Vol 62 ◽  
pp. 85-90
Author(s):  
L. V. Tashmatova ◽  
O. V. Matsneva ◽  
T. M. Khromova ◽  
V. V. Shakhov
Keyword(s):  
Exposure Time ◽  
Cell Walls ◽  
Prolonged Exposure ◽  
Ornamental Plants ◽  
Colchicine Treatment ◽  
Apple Trees ◽  
Open Ground ◽  
High Concentrations ◽  
Diploid Gametes

The article presents methods of experimental polyploidy of fruit, berry and ornamental plants. The purpose of this review is to highlight the problems and prospects of polyploidization of plants in the open ground and in vitro culture and the possibility of their application for apple trees. For the purpose of obtaining apple tetraploids as donors of diploid gametes, seed seedlings were treated with a solution of colchicine in concentrations of 0.1-0.4 % for 24 and 48 hours. Colchicine concentrations of 0.3 % and 0.4 % at 48 hours of treatment had a detrimental eff ect on their development. As a result, tetraploids and chimeras were obtained from seeds from free pollination of the varieties Orlik, Svezhest, Kandil Orlovsky, as well as from seeds obtained from crossing the varieties Svezhest×Bolotovskoe, Moskovskoe Оzherel’e×Imrus, Girlyanda×Venyaminovskoe. The optimal concentration of colchicine was 0.1 %. Methods of colchicine treatment have been studied: 1) adding to the nutrient medium, colchicine concentration: 0.01%, 0.02%, exposure time 24h-19 days; 2) applying amitotic solution to the growth point, colchicine concentration: 0.1 %, 0.2 %, exposure time 24h-7 days. To increase the penetration of colchicine through the cell walls, a 0.1 % dimexide solution was used. Studies have shown that high concentrations and prolonged exposure to colchicine reduce the viability of explants.

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