Analysis of the line pattern width and exposure efficiency in maskless lithography using a digital micromirror device

2011 ◽  
Vol 88 (10) ◽  
pp. 3145-3149 ◽  
Author(s):  
Hoonchul Ryoo ◽  
Dong Won Kang ◽  
Jae W. Hahn
Keyword(s):  
Maskless Lithography ◽  
Line Pattern ◽  
Digital Micromirror Device ◽  
Exposure Efficiency ◽  
Pattern Width

A high-speed exposure method for digital micromirror device based scanning maskless lithography system

Optik ◽  
2019 ◽  
Vol 185 ◽  
pp. 1036-1044 ◽  
Author(s):  
Chao Peng ◽  
Zezhou Zhang ◽  
Jianxiao Zou ◽  
Wenming Chi
Keyword(s):  
High Speed ◽  
Maskless Lithography ◽  
Digital Micromirror Device ◽  
Exposure Method ◽  
Lithography System

Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography

2009 ◽  
Author(s):  
Tao Wang ◽  
Marzia Quaglio ◽  
Fabrizio Pirri ◽  
Yang-Chun Cheng ◽  
David Busacker ◽  
...  
Keyword(s):  
Maskless Lithography ◽  
Digital Micromirror Device

Fabrication of passive micromixer using a digital micromirror device-based maskless lithography system

2014 ◽  
Vol 15 (7) ◽  
pp. 1417-1422 ◽  
Author(s):  
Yong-Kyu Cho ◽  
Tae-Heon Han ◽  
Seok-Jae Ha ◽  
Jung-Won Lee ◽  
Jong-Su Kim ◽  
...  
Keyword(s):  
Maskless Lithography ◽  
Digital Micromirror Device ◽  
Passive Micromixer ◽  
Lithography System
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