Impurity free vacancy diffusion induced quantum well intermixing based on hafnium dioxide films
2015 ◽
Vol 29
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pp. 150-154
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Keyword(s):
2015 ◽
Vol 644
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pp. 398-403
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Keyword(s):
Keyword(s):
2000 ◽
Vol 15
(10)
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pp. 1005-1009
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Keyword(s):
1997 ◽
Vol 33
(10)
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pp. 1784-1793
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1999 ◽
Vol 38
(Part 2, No. 11B)
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pp. L1303-L1305
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2007 ◽
Vol 46
(10A)
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pp. 6509-6513
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Keyword(s):
1994 ◽
Vol 30
(5)
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pp. 1189-1195
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