Polymer waveguide grating fabricated by two-photon initiated photopolymerization and its application as an input coupler

2008 ◽  
Vol 30 (6) ◽  
pp. 935-938 ◽  
Author(s):  
Yi Dong ◽  
Xiaoqiang Yu ◽  
Yuming Sun ◽  
Yufei Li ◽  
Xueyuan Hou ◽  
...  
2005 ◽  
Vol 44 (17) ◽  
pp. 3442 ◽  
Author(s):  
Yi-Ping Wang ◽  
Jian-Ping Chen ◽  
Xin-Wan Li ◽  
Jun-He Zhou ◽  
Hao Shen ◽  
...  

2016 ◽  
Vol 34 (17) ◽  
pp. 3966-3971 ◽  
Author(s):  
Christoph Prokop ◽  
Steffen Schoenhardt ◽  
Bert Laegel ◽  
Sandra Wolff ◽  
Arnan Mitchell ◽  
...  

2007 ◽  
Vol 21 (08) ◽  
pp. 481-488
Author(s):  
HAIMING ZHANG ◽  
DAMING ZHANG ◽  
ZHENKUN QIN ◽  
CHUNSHENG MA

An efficient vapor-redissolution technique is used to greatly reduce sidewall scattering loss in the polymer arrayed waveguide grating (AWG) fabricated on a silicon substrate. Smoother sidewalls are achieved and verified by scanning electron microscopy. Reduction of sidewall scattering loss is further measured for the loss measurement of both straight waveguides and AWG devices. The sidewall loss in straight polymer waveguide is decreased by 2.1 dB/cm, the insertion loss of our AWG device is reduced by about 5.5 dB for the central channel and 6.7 dB for the edge channels, the crosstalk is reduced by 2.5 dB, and 3-dB bandwidth is narrowed by 0.05 nm after the vapor-redissoluton treatment.


2012 ◽  
Author(s):  
M. E. Pollard ◽  
S. J. Pearce ◽  
R. Chen ◽  
S. Oo ◽  
M. D. B. Charlton

2015 ◽  
Vol 27 (18) ◽  
pp. 1985-1988 ◽  
Author(s):  
Yu Yang ◽  
Kaixin Chen ◽  
Wei Jin ◽  
Kin Seng Chiang

1988 ◽  
Vol 53 (21) ◽  
pp. 2011-2013 ◽  
Author(s):  
R. Burzynski ◽  
B. P. Singh ◽  
P. N. Prasad ◽  
R. Zanoni ◽  
G. I. Stegeman

1997 ◽  
Vol 33 (7) ◽  
pp. 623 ◽  
Author(s):  
R. Waldhäusl ◽  
B. Schnabel ◽  
E.-B. Kley ◽  
A. Bräuer

2013 ◽  
Vol 21 (20) ◽  
pp. 24318 ◽  
Author(s):  
Jian Hung Lin ◽  
Chun-Yen Tseng ◽  
Ching-Ting Lee ◽  
Hung-Chih Kan ◽  
Chia Chen Hsu

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