Investigating the structural and physical properties of hydrogenated amorphous carbon films fabricated by middle frequency pulsed unbalanced magnetron sputtering

2014 ◽  
Vol 438 ◽  
pp. 34-40 ◽  
Author(s):  
H.Y. Dai ◽  
Y.Q. Zhang ◽  
Z.P. Chen ◽  
F.X. Zhai
Keyword(s):  
Magnetron Sputtering ◽  
Physical Properties ◽  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Hydrogenated Amorphous Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Hydrogenated Amorphous

Characteristics of Palladium Doped Amorphous Carbon Films Fabricated by Unbalanced Magnetron Sputtering System

2021 ◽  
Vol 16 (6) ◽  
pp. 905-910
Author(s):  
Yong Seob Park ◽  
Young-Baek Kim ◽  
Sung Hwan Hwang ◽  
Jaehyeong Lee
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Amorphous Carbon ◽  
Closed Field ◽  
Hydrogenated Amorphous Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Dc Bias ◽  
Hydrogenated Amorphous

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.

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