Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method

2021 ◽  
Vol 16 (6) ◽  
pp. 905-910
Author(s):  
Yong Seob Park ◽  
Young-Baek Kim ◽  
Sung Hwan Hwang ◽  
Jaehyeong Lee

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.


2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.


Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.


2014 ◽  
Vol 258 ◽  
pp. 219-224 ◽  
Author(s):  
S.M.M. Dufrène ◽  
F. Cemin ◽  
M.R.F. Soares ◽  
C. Aguzzoli ◽  
M.E.H. Maia da Costa ◽  
...  

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