The electrical and structural properties of the hydrogenated amorphous carbon films grown by close field unbalanced magnetron sputtering

2005 ◽  
Vol 482 (1-2) ◽  
pp. 275-279 ◽  
Author(s):  
Yong Seob Park ◽  
Hyun Sik Myung ◽  
Jeon Geon Han ◽  
Byungyou Hong
1988 ◽  
Vol 109 (1) ◽  
pp. K39-K44 ◽  
Author(s):  
Fangqing Zhang ◽  
Guanghua Chen ◽  
Yafei Zhang ◽  
Gong Yu

2021 ◽  
Vol 16 (6) ◽  
pp. 905-910
Author(s):  
Yong Seob Park ◽  
Young-Baek Kim ◽  
Sung Hwan Hwang ◽  
Jaehyeong Lee

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.


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