Improved shielding design with an accelerated Monte Carlo simulation for a neutron generator at Missouri S&T

2017 ◽  
Vol 97 ◽  
pp. 123-132 ◽  
Author(s):  
Huseyin Sahiner ◽  
Edward T. Norris ◽  
Abdulaleem A. Bugis ◽  
Xin Liu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Neutron Generator ◽  
Shielding Design

Monte Carlo simulation on n-γ density logging using D-T neutron generator

2013 ◽  
Vol 25 (1) ◽  
pp. 253-258
Author(s):  
何雄英 He Xiongying ◽  
郑世平 Zheng Shiping ◽  
卢小龙 Lu Xiaolong ◽  
姚泽恩 Yao Zeen
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Neutron Generator

scholarly journals New Cf-252 neutron source shielding design based Monte Carlo simulation using material combination

AIP Advances ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 075203 ◽  
Author(s):  
Cebastien Joel Guembou Shouop ◽  
Sang-In Bak ◽  
Maurice Ndontchueng Moyo ◽  
Eric Jilbert Nguelem Mekongtso ◽  
David Strivay
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Neutron Source ◽  
Material Combination ◽  
Shielding Design

Monte Carlo simulation of explosive detection system based on a Deuterium–Deuterium (D–D) neutron generator

2014 ◽  
Vol 94 ◽  
pp. 118-124 ◽  
Author(s):  
K. Bergaoui ◽  
N. Reguigui ◽  
C.K. Gary ◽  
C. Brown ◽  
J.T. Cremer ◽  
...  
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Neutron Generator ◽  
Detection System ◽  
Explosive Detection

scholarly journals Evaluate Shielding Design of the Brachytherapy Unit by Using Monte Carlo Simulation Code

2015 ◽  
Vol 06 (07) ◽  
pp. 902-911 ◽  
Author(s):  
Ramin Jaberi ◽  
Mohammad Hadi Gholami ◽  
Abdolazim Sedighi Pashaki ◽  
Alireza Khoshghadam
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Simulation Code ◽  
Shielding Design

Electron Scattering in Solids

1990 ◽  
Vol 48 (2) ◽  
pp. 4-5
Author(s):  
Ryuichi Shimizu ◽  
Ze-Jun Ding
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Angular Distribution ◽  
Elastic Scattering ◽  
Electron Scattering ◽  
Cross Sections ◽  
Expansion Method ◽  
Electron Excitation ◽  
Partial Wave Expansion ◽  
Backscattered Electrons

Monte Carlo simulation has been becoming most powerful tool to describe the electron scattering in solids, leading to more comprehensive understanding of the complicated mechanism of generation of various types of signals for microbeam analysis.The present paper proposes a practical model for the Monte Carlo simulation of scattering processes of a penetrating electron and the generation of the slow secondaries in solids. The model is based on the combined use of Gryzinski’s inner-shell electron excitation function and the dielectric function for taking into account the valence electron contribution in inelastic scattering processes, while the cross-sections derived by partial wave expansion method are used for describing elastic scattering processes. An improvement of the use of this elastic scattering cross-section can be seen in the success to describe the anisotropy of angular distribution of elastically backscattered electrons from Au in low energy region, shown in Fig.l. Fig.l(a) shows the elastic cross-sections of 600 eV electron for single Au-atom, clearly indicating that the angular distribution is no more smooth as expected from Rutherford scattering formula, but has the socalled lobes appearing at the large scattering angle.

Determination of Stoichiometry of GaAs Component in (Gaas)Ge Epitaxially Grown Thin Films by Electron Microprobe X-Ray Analysis

1990 ◽  
Vol 48 (2) ◽  
pp. 264-265
Author(s):  
D. R. Liu ◽  
S. S. Shinozaki ◽  
R. J. Baird
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Compound Semiconductors ◽  
Energy Dispersive Analysis ◽  
X Ray ◽  
Metastable Alloys ◽  
Lower Voltage

The epitaxially grown (GaAs)Ge thin film has been arousing much interest because it is one of metastable alloys of III-V compound semiconductors with germanium and a possible candidate in optoelectronic applications. It is important to be able to accurately determine the composition of the film, particularly whether or not the GaAs component is in stoichiometry, but x-ray energy dispersive analysis (EDS) cannot meet this need. The thickness of the film is usually about 0.5-1.5 μm. If Kα peaks are used for quantification, the accelerating voltage must be more than 10 kV in order for these peaks to be excited. Under this voltage, the generation depth of x-ray photons approaches 1 μm, as evidenced by a Monte Carlo simulation and actual x-ray intensity measurement as discussed below. If a lower voltage is used to reduce the generation depth, their L peaks have to be used. But these L peaks actually are merged as one big hump simply because the atomic numbers of these three elements are relatively small and close together, and the EDS energy resolution is limited.

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