Structural, optical and electrical properties of Nd-doped SnO2 thin films fabricated by reactive magnetron sputtering for solar cell devices

2016 ◽  
Vol 145 ◽  
pp. 134-141 ◽  
Author(s):  
Karima Bouras ◽  
Guy Schmerber ◽  
Hervé Rinnert ◽  
Damien Aureau ◽  
Hyeonwook Park ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Optical And Electrical Properties ◽  
Reactive Magnetron ◽  
Sno2 Thin Films

scholarly journals Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

2014 ◽  
Vol 32 (3) ◽  
pp. 457-464 ◽  
Author(s):  
Michal Mazur ◽  
Danuta Kaczmarek ◽  
Eugeniusz Prociow ◽  
Jaroslaw Domaradzki ◽  
Damian Wojcieszak ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
High Energy ◽  
Reactive Magnetron Sputtering ◽  
Optical And Electrical Properties ◽  
Reactive Magnetron ◽  
Tio2 Anatase ◽  
Post Process ◽  
Good Transparency

AbstractIn this work the results of investigations of the titanium-niobium oxides thin films have been reported. The thin films were manufactured with the aid of a modified reactive magnetron sputtering process. The aim of the research was the analysis of structural, optical and electrical properties of the deposited thin films. Additionally, the influence of post-process annealing on the properties of studied coatings has been presented. The as-deposited coatings were amorphous, while annealing at 873 K caused a structural change to the mixture of TiO2 anatase-rutile phases. The prepared thin films exhibited good transparency with transmission level of ca. 50 % and low resistivity varying from 2 Ωcm to 5×10−2 Ωcm, depending on the time and temperature of annealing. What is worth to emphasize, the sign of Seebeck coefficient changed after the annealing process from the electron to hole type electrical conduction.

Structural, optical and electrical properties of Cd-doped SnO2 thin films grown by RF reactive magnetron co-sputtering

2012 ◽  
Vol 258 (7) ◽  
pp. 2459-2463 ◽  
Author(s):  
F. de Moure-Flores ◽  
J.G. Quiñones-Galván ◽  
A. Hernández-Hernández ◽  
A. Guillén-Cervantes ◽  
M.A. Santana-Aranda ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Optical And Electrical Properties ◽  
Reactive Magnetron ◽  
Sno2 Thin Films

Effect of reactive magnetron sputtering parameters on structural and electrical properties of hafnium oxide thin films

2014 ◽  
Vol 301 ◽  
pp. 28-33 ◽  
Author(s):  
Magdalena Szymańska ◽  
Sylwia Gierałtowska ◽  
Łukasz Wachnicki ◽  
Marcin Grobelny ◽  
Katarzyna Makowska ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Hafnium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Structural And Electrical Properties

Optical and electrical properties of vanadium pentoxide films prepared by RF reactive magnetron sputtering

2015 ◽  
Vol 23 (9) ◽  
pp. 2438-2445 ◽  
Author(s):  
张圣斌 ZHANG Sheng-bin ◽  
左敦稳 ZUO Dun-wen ◽  
卢文壮 LU Wen-zhuang ◽  
左杨平 ZUO Yang-ping
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Vanadium Pentoxide ◽  
Reactive Magnetron Sputtering ◽  
Optical And Electrical Properties ◽  
Reactive Magnetron
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