gas sensing
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2022 ◽  
Vol 431 ◽  
pp. 133947
Author(s):  
Farideh Zergani ◽  
Zahra Tavangar

2022 ◽  
Vol 26 ◽  
pp. 101355
Author(s):  
Yinfen Cheng ◽  
Zhong Li ◽  
Tao Tang ◽  
Kai Xu ◽  
Hao Yu ◽  
...  

2022 ◽  
Vol 26 ◽  
pp. 101307
Author(s):  
Artavazd Kirakosyan ◽  
Moon Ryul Sihn ◽  
Min-Gi Jeon ◽  
Rezaul M.D. Kabir ◽  
Jihoon Choi

2022 ◽  
Vol 354 ◽  
pp. 131221
Author(s):  
Weiwei Guo ◽  
Yuting Shuai ◽  
Xuecheng Liu ◽  
Jie Zhang ◽  
Jiang Wang ◽  
...  

Sensors ◽  
2022 ◽  
Vol 22 (2) ◽  
pp. 626
Author(s):  
Seokhun Kwon ◽  
Seokwon Lee ◽  
Joouk Kim ◽  
Chulmin Park ◽  
Hosung Jung ◽  
...  

Recently, as air pollution and particulate matter worsen, the importance of a platform that can monitor the air environment is emerging. Especially, among air pollutants, nitrogen dioxide (NO2) is a toxic gas that can not only generate secondary particulate matter, but can also derive numerous toxic gases. To detect such NO2 gas at low concentration, we fabricated a GNWs/NiO-WO3/GNWs heterostructure-based gas sensor using microwave plasma-enhanced chemical vapor deposition (MPECVD) and sputter, and we confirmed the NO2 detection characteristics between 10 and 50 ppm at room temperature. The morphology and carbon lattice characteristics of the sensing layer were investigated using field emission scanning electron microscopy (FESEM) and Raman spectroscopy. In the gas detection measurement, the resistance negative change according to the NO2 gas concentration was recorded. Moreover, it reacted even at low concentrations such as 5–7 ppm, and showed excellent recovery characteristics of more than 98%. Furthermore, it also showed a change in which the reactivity decreased with respect to humidity of 33% and 66%.


Sensors ◽  
2022 ◽  
Vol 22 (2) ◽  
pp. 651
Author(s):  
Jakub Bronicki ◽  
Dominik Grochala ◽  
Artur Rydosz

In this paper, we describe the device developed to control the deposition parameters to manage the glancing angle deposition (GLAD) process of metal-oxide thin films for gas-sensing applications. The GLAD technique is based on a set of parameters such as the tilt, rotation, and substrate temperature. All parameters are crucial to control the deposition of nanostructured thin films. Therefore, the developed GLAD controller enables the control of all parameters by the scientist during the deposition. Additionally, commercially available vacuum components were used, including a three-axis manipulator. High-precision readings were tested, where the relative errors calculated using the parameters provided by the manufacturer were 1.5% and 1.9% for left and right directions, respectively. However, thanks to the formula developed by our team, the values were decreased to 0.8% and 0.69%, respectively.


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