Pulsed laser deposition of refractive-index-graded broadband antireflection coatings for silicon solar cells

2016 ◽  
Vol 147 ◽  
pp. 37-45 ◽  
Author(s):  
Chun Deng ◽  
Hyungson Ki
1999 ◽  
Vol 69 (7) ◽  
pp. S409-S411 ◽  
Author(s):  
L.M. Doeswijk ◽  
H.H.C. de Moor ◽  
D.H.A. Blank ◽  
H. Rogalla

2021 ◽  
Vol 6 (2) ◽  
pp. 2000856
Author(s):  
Yury Smirnov ◽  
Laura Schmengler ◽  
Riemer Kuik ◽  
Pierre‐Alexis Repecaud ◽  
Mehrdad Najafi ◽  
...  

2015 ◽  
Vol 141 ◽  
pp. 322-330 ◽  
Author(s):  
Mohammadreza Nematollahi ◽  
Xiaodong Yang ◽  
Lars Martin Sandvik Aas ◽  
Zahra Ghadyani ◽  
Morten Kildemo ◽  
...  

2015 ◽  
Vol 25 (27) ◽  
pp. 4321-4327 ◽  
Author(s):  
Sylvio Schubert ◽  
Florian Schmidt ◽  
Holger von Wenckstern ◽  
Marius Grundmann ◽  
Karl Leo ◽  
...  

2019 ◽  
Vol 27 ◽  
pp. 11-20 ◽  
Author(s):  
Mohammed T. Hussein ◽  
Reem R. Mohammed

The optical absorption spectrum, Photoluminesces, and non-linear optical properties for Copper Phthalocyanine (CuPc) thin films (150,300 and 450 nm) respectively have been investigated via pulsed laser deposition technique. The absorption spectrum indicted that there are two bands one in UV around 330 nm which called B-band and the second in Visible around 650nm which called Q-band. Photoluminescence spectrum related to deposit samples has been determined with different thicknesses. From closed and open aperture Z-scan data non-linear absorption coefficient and non-linear refractive index have been calculated respectively using He-Ne laser which have beam waist of (24.2 μm), wave-length of (632.8 nm) and Rayleigh thickness was 2.9 mm. Through dividing closed by open apertures, non-linear refractive index was calculated accurately. Finally, the study also showed the suitability of the deposited films as an optical limiter at the wavelength 632.8 nm.


Solar Energy ◽  
2012 ◽  
Vol 86 (11) ◽  
pp. 3146-3152 ◽  
Author(s):  
Feng-Hao Hsu ◽  
Na-Fu Wang ◽  
Yu-Zen Tsai ◽  
Mau-Phon Houng

2007 ◽  
Vol 14 (06) ◽  
pp. 1079-1082 ◽  
Author(s):  
HONGXIA LI ◽  
XIN WU ◽  
RENGUO SONG ◽  
JIYANG WANG

High-quality Nd:LuVO 4 thin films have been grown on silica glass substrates by using a pulsed laser deposition technique. X-ray diffraction results show that the as-deposited Nd:LuVO 4 film is basically oriented polycrystalline, and strong (200) peak was revealed. The waveguide property was characterized by the prism-coupling method. The refractive index of the propagation mode is higher than that of the silica glass substrate which means that the dips correspond to real propagation mode, where the light could be well defined. The surface morphology of the deposited Nd:LuVO 4 films was also observed by using an atomic force microscopy.


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