One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor
2009 ◽
Vol 204
(4)
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pp. 428-432
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Keyword(s):
2010 ◽
Vol 7
(9-10)
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pp. 836-845
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2014 ◽
Vol 54
(1S)
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pp. 01AG01
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2017 ◽
Vol 137
(6)
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pp. 328-333
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2009 ◽
Vol 129
(6)
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pp. 403-408
2016 ◽
Vol 136
(4)
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pp. 180-185
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2015 ◽
Vol 135
(7)
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pp. 435-436
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2013 ◽
Vol 133
(12)
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pp. 642-647
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2014 ◽
Vol 3
(8)
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pp. 25
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High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2019 ◽
Vol 23
(1)
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pp. 71-75
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Keyword(s):
Keyword(s):