Phase behavior and crystallization in blends of a low molecular weight polyethylene-block-poly(ethylene oxide) diblock copolymer and poly(hydroxyether of bisphenol A)

2006 ◽  
Vol 451 (1-2) ◽  
pp. 168-173 ◽  
Author(s):  
Qipeng Guo
2004 ◽  
Vol 25 (8) ◽  
pp. 853-857 ◽  
Author(s):  
Lu Sun ◽  
Yuxiu Liu ◽  
Lei Zhu ◽  
Benjamin S. Hsiao ◽  
Carlos A. Avila-Orta

2013 ◽  
Vol 2013 ◽  
pp. 1-7 ◽  
Author(s):  
Hui Wu ◽  
Xiaohua Huang

The structural evolution of low-molecular-weight poly(ethylene oxide)-block-polystyrene (PEO-b-PS) diblock copolymer thin film with various initial film thicknesses on silicon substrate under thermal annealing was investigated by atomic force microscopy, optical microscopy, and contact angle measurement. At film thickness below half of the interlamellar spacing of the diblock copolymer (6.2 nm), the entire silicon is covered by a polymer brush with PEO blocks anchored on the Si substrate due to the substrate-induced effect. When the film is thicker than 6.2 nm, a dense polymer brush which is equal to half of an interlamellar layer was formed on the silicon, while the excess material dewet this layer to form droplets. The droplet surface was rich with PS block and the PEO block crystallized inside the bigger droplet to form spherulite.


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