Tribological performance of a tungsten disulfide lubricant film prepared by atomic layer deposition using tungsten hexacarbonyl and hydrogen sulfide as precursors

2017 ◽  
Vol 114 ◽  
pp. 478-484 ◽  
Author(s):  
Yongfeng Sun ◽  
Zhimin Chai ◽  
Xinchun Lu ◽  
Jing Lu
Keyword(s):  
Hydrogen Sulfide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tribological Performance ◽  
Tungsten Disulfide ◽  
Lubricant Film ◽  
Tungsten Hexacarbonyl ◽  
Layer Deposition

Reaction Mechanism of Atomic Layer Deposition of Aluminum Sulfide using Trimethylaluminum and Hydrogen Sulfide

2021 ◽  
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang
Keyword(s):  
Hydrogen Sulfide ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Sulfides ◽  
Layer Deposition

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...

Intercalation based tungsten disulfide (WS2) Li-ion battery anode grown by atomic layer deposition

RSC Advances ◽  
2016 ◽  
Vol 6 (44) ◽  
pp. 38024-38032 ◽  
Author(s):  
Dip K. Nandi ◽  
Uttam K. Sen ◽  
Arpan Dhara ◽  
Sagar Mitra ◽  
Shaibal K. Sarkar
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Electrochemical Stability ◽  
Tungsten Disulfide ◽  
Li Ion Battery ◽  
Layer Deposition ◽  
Li Ion ◽  
Battery Anode

ALD grown WS2 films are recommended to use as intercalation material in Li-ion battery because of its excellent electrochemical stability.

Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition

ACS Nano ◽  
2013 ◽  
Vol 7 (12) ◽  
pp. 11333-11340 ◽  
Author(s):  
Jeong-Gyu Song ◽  
Jusang Park ◽  
Wonseon Lee ◽  
Taejin Choi ◽  
Hanearl Jung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tungsten Disulfide ◽  
Wafer Scale ◽  
Layer Deposition

Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide

2014 ◽  
Vol 26 (2) ◽  
pp. 1029-1039 ◽  
Author(s):  
Xiangbo Meng ◽  
Joseph A. Libera ◽  
Timothy T. Fister ◽  
Hua Zhou ◽  
Jenny K. Hedlund ◽  
...  
Keyword(s):  
Hydrogen Sulfide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gallium Sulfide ◽  
Layer Deposition

Atomic layer deposition of ZnS thin films based on diethyl zinc and hydrogen sulfide

2002 ◽  
Vol 234 (4) ◽  
pp. 690-698 ◽  
Author(s):  
Gert Stuyven ◽  
Patrick De Visschere ◽  
Andriy Hikavyy ◽  
Kristiaan Neyts
Keyword(s):  
Thin Films ◽  
Hydrogen Sulfide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Diethyl Zinc ◽  
Layer Deposition

Design of an atomic layer deposition reactor for hydrogen sulfide compatibility

2010 ◽  
Vol 81 (4) ◽  
pp. 044102 ◽  
Author(s):  
Neil P. Dasgupta ◽  
James F. Mack ◽  
Michael C. Langston ◽  
Al Bousetta ◽  
Fritz B. Prinz
Keyword(s):  
Hydrogen Sulfide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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