Effect of substrate bias voltage and substrate on the structural properties of amorphous carbon films deposited by unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2004.11.158 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 45-49 ◽

Author(s):

I. Ahmad ◽

S.S. Roy ◽

P.D. Maguire ◽

P. Papakonstantinou ◽

J.A. McLaughlin

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Bias Voltage ◽

Amorphous Carbon ◽

Carbon Films ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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The electrical and structural properties of the hydrogenated amorphous carbon films grown by close field unbalanced magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2004.11.160 ◽

2005 ◽

Vol 482 (1-2) ◽

pp. 275-279 ◽

Author(s):

Yong Seob Park ◽

Hyun Sik Myung ◽

Jeon Geon Han ◽

Byungyou Hong

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Hydrogenated Amorphous

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Structural alteration induced by substrate bias voltage variation in diamond-like carbon films fabricated by unbalanced magnetron sputtering

Diamond and Related Materials ◽

10.1016/j.diamond.2018.10.019 ◽

2018 ◽

Vol 90 ◽

pp. 214-220 ◽

Author(s):

Morimasa Nakamura ◽

Yuka Takagawa ◽

Ken-ichi Miura ◽

Junpei Kobata ◽

Wenliang Zhu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Carbon Films ◽

Structural Alteration ◽

Diamond Like Carbon ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Voltage Variation ◽

Unbalanced Magnetron

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Effects of substrate bias voltage on structure and internal stress of amorphous carbon films on γ-Fe substrate: Molecular dynamics simulation

Computational Materials Science ◽

10.1016/j.commatsci.2020.110206 ◽

2020 ◽

pp. 110206

Author(s):

Silong Zhang ◽

Yefei Zhou ◽

Wei Shao ◽

Tianshi Hu ◽

Lixiang Rao ◽

...

Keyword(s):

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Internal Stress ◽

Bias Voltage ◽

Amorphous Carbon ◽

Carbon Films ◽

Dynamics Simulation ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Amorphous Carbon Films

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Study on nitrogenated amorphous carbon films prepared by unbalanced magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2168027 ◽

2006 ◽

Vol 99 (3) ◽

pp. 033505 ◽

Author(s):

J. R. Shi

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Mechanisms of growth, properties and degradation of amorphous carbon films by closed field unbalanced magnetron sputtering on stainless steel bipolar plates for PEMFCs

Applied Surface Science ◽

10.1016/j.apsusc.2017.06.122 ◽

2017 ◽

Vol 422 ◽

pp. 921-931 ◽

Author(s):

Feifei Bi ◽

Kun Hou ◽

Peiyun Yi ◽

Linfa Peng ◽

Xinmin Lai

Keyword(s):

Stainless Steel ◽

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Bipolar Plates ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Growth Properties

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Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2011.12.048 ◽

2012 ◽

Vol 258 (8) ◽

pp. 3864-3870 ◽

Author(s):

Yanhong Lv ◽

Li Ji ◽

Xiaohong Liu ◽

Hongxuan Li ◽

Huidi Zhou ◽

...

Keyword(s):

Magnetron Sputtering ◽

Bias Voltage ◽

Substrate Bias ◽

Structure And Properties ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Influence Of Substrate

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Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering

Materials Letters ◽

10.1016/j.matlet.2003.10.021 ◽

2004 ◽

Vol 58 (9) ◽

pp. 1513-1516 ◽

Author(s):

H Myung

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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The parameter space of hydrogen content added to Ar–nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2013.02.032 ◽

2013 ◽

Vol 223 ◽

pp. 75-78 ◽

Author(s):

J.-S. Ko ◽

J.-K. Park ◽

W.-S. Lee ◽

Y.-J. Baik

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Magnetron Sputtering ◽

Parameter Space ◽

Bias Voltage ◽

Cubic Boron Nitride ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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The effect of duty cycle on the microstructure and properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/43/50/505401 ◽

2010 ◽

Vol 43 (50) ◽

pp. 505401 ◽

Author(s):

Yongjun Wang ◽

Hongxuan Li ◽

Li Ji ◽

Fei Zhao ◽

Xiaohong Liu ◽

...

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Microstructure And Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Characteristics of sputtered amorphous carbon films prepared by a closed-field unbalanced magnetron sputtering method

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2008.08.007 ◽

2008 ◽

Vol 354 (52-54) ◽

pp. 5504-5508 ◽

Author(s):

Yong Seob Park ◽

Byungyou Hong

Keyword(s):

Magnetron Sputtering ◽

Amorphous Carbon ◽

Carbon Films ◽

Closed Field ◽

Amorphous Carbon Films ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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