In-situ FTIR studies of the growth of vanadium dioxide coatings on glass by atmospheric pressure chemical vapour deposition for VCl4 and H2O system

2007 ◽  
Vol 515 (24) ◽  
pp. 8768-8770 ◽  
Author(s):  
D. Vernardou ◽  
M.E. Pemble ◽  
D.W. Sheel
Keyword(s):  
Chemical Vapour Deposition ◽  
Vanadium Dioxide ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
In Situ Ftir ◽  
Ftir Studies ◽  
Pressure Chemical

scholarly journals In-situ spatial and temporal electrical characterization of ZnO thin films deposited by atmospheric pressure chemical vapour deposition on flexible polymer substrates

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Alexander Jones ◽  
Kissan Mistry ◽  
Manfred Kao ◽  
Ahmed Shahin ◽  
Mustafa Yavuz ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Flexible Substrate ◽  
Chemical Vapour ◽  
Film Deposition ◽  
Zno Films ◽  
Flexible Polymer ◽  
Pressure Chemical

AbstractA technique is presented for collecting data on both the spatial and temporal variations in the electrical properties of a film as it is deposited on a flexible substrate. A flexible printed circuit board substrate with parallel electrodes distributed across its surface was designed. Zinc oxide films were then deposited on the flexible substrate at different temperatures via atmospheric pressure chemical vapour deposition (AP-CVD) using a spatial atomic layer deposition system. AP-CVD is a promising high-throughput thin film deposition technique with applications in flexible electronics. Collecting data on the film properties in-situ allows us to directly observe how deposition conditions affect the evolution of those properties in real-time. The spatial uniformity of the growing film was monitored, and the various stages of film nucleation and growth on the polymer substrate were observed. The measured resistance of the films was observed to be very high until a critical amount of material has been deposited, consistent with Volmer–Weber growth. Furthermore, monitoring the film resistance during post-deposition cooling enabled immediate identification of metallic or semiconducting behaviour within the conductive ZnO films. This technique allows for a more complete understanding of metal chalcogen film growth and properties, and the high volume of data generated will be useful for future implementations of machine-learning directed materials science.

Atmospheric Pressure Chemical Vapour Deposition of NbSe2 Thin Films on Glass

2006 ◽  
Vol 2006 (6) ◽  
pp. 1255-1259 ◽  
Author(s):  
Nicolas D. Boscher ◽  
Claire J. Carmalt ◽  
Ivan P. Parkin
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Pressure Chemical

scholarly journals Atmospheric pressure chemical vapour deposition of fluorine-doped tin(IV) oxide from fluoroalkyltin precursors

2005 ◽  
Vol 19 (5) ◽  
pp. 644-657 ◽  
Author(s):  
Joanne E. Stanley ◽  
Anthony C. Swain ◽  
Kieran C. Molloy ◽  
David W. H. Rankin ◽  
Heather E. Robertson ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Pressure Chemical

Silicon carbide emitter diodes by LPCVD (low-pressure chemical vapour deposition) using di-tert-butylsilane

1992 ◽  
Vol 70 (10-11) ◽  
pp. 946-948
Author(s):  
S. B. Hewitt ◽  
S.-P. Tay ◽  
N. G. Tarr ◽  
A. R. Boothroyd
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Silicon Substrates ◽  
Phosphorus Doping ◽  
Forward Current ◽  
Pressure Chemical ◽  
Sic Films

Stoichiometric SiC films formed by low-pressure chemical vapour deposition from a di-tert-butylsilane source with in situ phosphorus doping from tert-butylphosphine were used as emitters in heterojunction diodes fabricated on lightly doped silicon substrates. Diode characteristics are nearly ideal, with forward current dominated by injection-diffusion in the silicon substrate.

Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells

2009 ◽  
Vol 517 (10) ◽  
pp. 3061-3065 ◽  
Author(s):  
D.W. Sheel ◽  
H.M. Yates ◽  
P. Evans ◽  
U. Dagkaldiran ◽  
A. Gordijn ◽  
...  
Keyword(s):  
Solar Cells ◽  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Optimum Performance ◽  
Pressure Chemical

Growth Mode and Kinetics of Atmospheric Pressure Chemical Vapour Deposition of β-SiC on Si(100) Substrate

1998 ◽  
Vol 264-268 ◽  
pp. 227-230 ◽  
Author(s):  
Gabriel Ferro ◽  
H. Vincent ◽  
Yves Monteil ◽  
Didier Chaussende ◽  
J. Bouix
Keyword(s):  
Chemical Vapour Deposition ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Growth Mode ◽  
Pressure Chemical ◽  
Kinetics Of
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