High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD

2008 ◽  
Vol 517 (1) ◽  
pp. 242-244 ◽  
Author(s):  
K. Yasutake ◽  
H. Ohmi ◽  
Y. Kirihata ◽  
H. Kakiuchi
Keyword(s):  
Atmospheric Pressure ◽  
Low Temperatures ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
High Quality ◽  
Pressure Plasma

In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD

2008 ◽  
Vol 40 (6-7) ◽  
pp. 984-987 ◽  
Author(s):  
Y. Kirihata ◽  
T. Nomura ◽  
H. Ohmi ◽  
H. Kakiuchi ◽  
K. Yasutake
Keyword(s):  
Epitaxial Growth ◽  
Atmospheric Pressure ◽  
Low Temperatures ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
Pressure Plasma

High-Rate Growth of Defect-Free Epitaxial Si at Low Temperatures by Atmospheric Pressure Plasma CVD

2005 ◽  
Author(s):  
Takuya Wakamiya ◽  
Hiromasa Ohmi ◽  
Hiroaki Kakiuchi ◽  
Heiji Watanabe ◽  
Kiyoshi Yasutake ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Low Temperatures ◽  
Atmospheric Pressure Plasma ◽  
High Rate ◽  
Plasma Cvd ◽  
Pressure Plasma

In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD

2019 ◽  
Vol 25 (8) ◽  
pp. 309-315 ◽  
Author(s):  
Takayuki Ohnishi ◽  
Yutaka Kirihata ◽  
Hiromasa Ohmi ◽  
Hiroaki Kakiuchi ◽  
Kiyoshi Yasutake
Keyword(s):  
Epitaxial Growth ◽  
Atmospheric Pressure ◽  
Low Temperatures ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
Selective Epitaxial Growth ◽  
Pressure Plasma

scholarly journals Deposition Characteristics of SiNx Films by Atmospheric Pressure Plasma CVD

2004 ◽  
Vol 70 (2) ◽  
pp. 292-296
Author(s):  
Yuzo MORI ◽  
Hiroaki KAKIUCHI ◽  
Hiromasa OHMI ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
Pressure Plasma

scholarly journals Effect of Silane Concentration on Structure of the Poly-Si Films Prepared at High Rates by Atmospheric Pressure Plasma CVD

2005 ◽  
Vol 71 (11) ◽  
pp. 1393-1398
Author(s):  
Hiromasa OHMI ◽  
Hiroaki KAKIUCHI ◽  
Yasuji NAKAHAMA ◽  
Yusuke EBATA ◽  
Kiyoshi YASUTAKE ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
Pressure Plasma ◽  
Si Films ◽  
Silane Concentration

scholarly journals Purification of the Process Environment in Atmospheric Pressure Plasma CVD System.

2000 ◽  
Vol 66 (11) ◽  
pp. 1802-1806
Author(s):  
Yuzo MORI ◽  
Hiroaki KAKIUCHI ◽  
Kumayasu YOSHII ◽  
Kiyoshi YASUTAKE
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Cvd ◽  
Pressure Plasma
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