Amorphous silicon carbide thin films (a-SiC:H) deposited by plasma-enhanced chemical vapor deposition as protective coatings for harsh environment applications
2013 ◽
Vol 217
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pp. 88-93
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2016 ◽
pp. 13-19
2011 ◽
Vol 206
(6)
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pp. 1503-1506
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1989 ◽
Vol 177
(1-2)
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pp. 253-262
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2003 ◽
Vol 169-170
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pp. 624-627
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2016 ◽
Vol 66
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pp. 1-9
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