Effects of sputtering power and pressure on properties of ZnO:Ga thin films prepared by oblique-angle deposition

2011 ◽  
Vol 520 (4) ◽  
pp. 1233-1237 ◽  
Author(s):  
S. Flickyngerová ◽  
M. Netrvalová ◽  
P. Šutta ◽  
I. Novotný ◽  
V. Tvarožek ◽  
...  
Keyword(s):  
Thin Films ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Sputtering Power ◽  
Angle Deposition

Nanostructure optimization of Zr-W-Ti metallic glass thin films via multitarget co-sputtering with oblique angle deposition approach

2021 ◽  
pp. 161265
Author(s):  
Rattanachai Kowong ◽  
Somyod Denchitcharoen ◽  
Tossaporn Lertvanithphol ◽  
Narit Triamnak ◽  
Chanunthorn Chananonnawathorn ◽  
...  
Keyword(s):  
Thin Films ◽  
Metallic Glass ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Angle Deposition

Polarization Conversion of Anisotropic SiO2 Columnar Thin Films Prepared by Using Oblique Angle Deposition

2011 ◽  
Vol 58 (4(2)) ◽  
pp. 1026-1030 ◽  
Author(s):  
Yu Zou ◽  
Jin Joo Kim ◽  
Yong Jun Park ◽  
Ji Bum Kim ◽  
Young Deung Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Polarization Conversion ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Angle Deposition

Oblique angle deposition of TiO2 thin films prepared by electron-beam evaporation

2010 ◽  
Vol 257 (4) ◽  
pp. 1149-1153 ◽  
Author(s):  
Min Wook Pyun ◽  
Eui Jung Kim ◽  
Dae-Hwang Yoo ◽  
Sung Hong Hahn
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Electron Beam Evaporation ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Tio2 Thin Films ◽  
Angle Deposition

Microstructure and Optical Properties of Sm3+ Doped TiO2 Thin Films by Oblique Angle Deposition

2011 ◽  
Vol 129 (1) ◽  
pp. 201-207
Author(s):  
Xiudi Xiao ◽  
Lei Miao ◽  
Gang Xu ◽  
Jianda Shao ◽  
Zhengxiu Fan
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Angle Deposition

scholarly journals Vapor Phase Sensing Using Metal Nanorod Thin Films Grown by Cryogenic Oblique Angle Deposition

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Piyush Shah ◽  
Dongquan Ju ◽  
Xiaoxu Niu ◽  
Andrew M. Sarangan
Keyword(s):  
Thin Films ◽  
Vapor Phase ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Surface Enhanced ◽  
Surface Enhanced Raman ◽  
Enhanced Raman Scattering ◽  
Comsol Simulation ◽  
Angle Deposition ◽  
Good Agreement

We demonstrate the chemical sensing capability of silver nanostructured films grown by cryogenic oblique angle deposition (OAD). For comparison, the films are grown side by side at cryogenic (~100 K) and at room temperature (~300 K) by e-beam evaporation. Based on the observed structural differences, it was hypothesized that the cryogenic OAD silver films should show an increased surface enhanced Raman scattering (SERS) sensitivity. COMSOL simulation results are presented to validate this hypothesis. Experimental SERS results of 4-aminobenzenethiol (4-ABT) Raman test probe molecules in vapor phase show good agreement with the simulation and indicate promising SERS applications for these nanostructured thin films.

“Enhanced Layer Coverage of Thin Films by Oblique Angle Deposition”

2004 ◽  
Vol 859 ◽  
Author(s):  
Tansel Karabacak ◽  
Gwo-Ching Wang ◽  
Toh-Ming Lu
Keyword(s):  
Thin Films ◽  
Surface Diffusion ◽  
Kinetic Monte Carlo ◽  
Monte Carlo Algorithm ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Island Growth ◽  
Average Growth ◽  
Substrate Rotation ◽  
Angle Deposition

ABSTRACTThe characteristics of nucleation and island growth in oblique angle deposition with substrate rotation have recently attracted interest due to the formation of novel 3D nanostructures by a physical self-assembly process. In this study, we present the results of a solid-on-solid growth simulation by a kinetic Monte Carlo algorithm that explores the layer coverage evolution of thin films during oblique angle deposition. The simulations accounted for oblique incidence flux, shadowing effect, surface diffusion, and substrate rotation. The layer coverage, the ratio of average island volume to average island size, and root-mean-square (RMS) roughness values are reported for the initial stages of island growth from submonolayer thicknesses up to a few monolayers. RMS roughness was also investigated for later stages of the growth. Our results show that, for small deposition angles and with limited or no surface diffusion included, the average growth rate of islands is faster in lateral directions that results in enhanced layer coverages and smoother films. This is due to that the sides of the islands can be exposed to the incident flux more effectively at small deposition angles. On the other hand, normal incidence and high oblique angle depositions give poorer layer coverages and much rougher films due to the slower growth rates in lateral directions.

scholarly journals Polarized photoluminescence of Alq3 thin films obtained by the method of oblique-angle deposition

2021 ◽  
Vol 22 (4) ◽  
pp. 209-215
Author(s):  
I Karbovnyk ◽  
B Sadovyi ◽  
B Turko ◽  
A Kukhta ◽  
V Vasil�yev ◽  
...  
Keyword(s):  
Thin Films ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Angle Deposition

scholarly journals (Invited) Plasma Assisted Oblique Angle Deposition of Transparent and Conductive in-Plane Anisotropic ITO Thin Films

2017 ◽  
Vol 77 (3) ◽  
pp. 9-15 ◽  
Author(s):  
Julian Parra-Barranco ◽  
Juan Ramon Sanchez-Valencia ◽  
Francisco J. Aparicio ◽  
Francisco Garcia-Garcia ◽  
Francisco J. Ferrer ◽  
...  
Keyword(s):  
Thin Films ◽  
Oblique Angle Deposition ◽  
Oblique Angle ◽  
Ito Thin Films ◽  
Angle Deposition
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