Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition

2013 ◽  
Vol 532 ◽  
pp. 89-93 ◽  
Author(s):  
Takatoshi Yamada ◽  
Masatou Ishihara ◽  
Masataka Hasegawa
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Roll To Roll

Roll-to-Roll Graphene Synthesis by Using Microwave Plasma Chemical Vapor Deposition at Low Temperature

2012 ◽  
Vol 1401 ◽  
Author(s):  
Takatoshi Yamada ◽  
Masatou Ishihara ◽  
Jaeho Kim ◽  
Masataka Hasegawa ◽  
Sumio Iijima
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Graphene Film ◽  
Chemical Vapor ◽  
Large Area ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Graphene Synthesis ◽  
Film Substrate

ABSTRACTWe reported continuous depositions of grahene films on copper foils with A4 width using roll-to-toll microwave plasma chemical vapor deposition (MWPCVD) technique. A pair of winder and unwinder was built into an MWPCVD apparatus. Surface-wave plasma enabled us to deposit large-area graphene film (substrate stage is of 480 mm x 300 mm) at temperatures below 400 ºC. In Raman spectra, G- and G’-band attributed to graphene were obtained. In addition, Dand D’-band originated from defects and/or edges were detected. These results suggested that the obtained graphene films consisted of flake boundaries and defects. After the transferring graphene onto the polyethylene terephthalate film, uniform transmittance and sheet resistance were confirmed.

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