Nucleation-enhancing treatment for diamond growth over a large-area using magnetoactive microwave plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287411 ◽

2000 ◽

Vol 88 (5) ◽

pp. 2979-2983 ◽

Author(s):

Hyeongmin Jeon ◽

Chunlei Wang ◽

Akimitsu Hatta ◽

Toshimichi Ito

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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A 915 MHz/75 kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films

Diamond and Related Materials ◽

10.1016/j.diamond.2017.08.007 ◽

2017 ◽

Vol 78 ◽

pp. 67-72 ◽

Author(s):

Y.F. Li ◽

X.M. An ◽

X.C. Liu ◽

L. Jiang ◽

P.W. Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cylindrical Cavity ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Diamond growth on silicon nitride by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/0925-9635(92)90107-y ◽

1992 ◽

Vol 1 (7) ◽

pp. 818-823 ◽

Author(s):

M.C. Salvadori ◽

J.W. Ager ◽

I.G. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Textured diamond growth by microwave plasma chemical vapor deposition

Applied Surface Science ◽

10.1016/0169-4332(95)00212-x ◽

1996 ◽

Vol 92 ◽

pp. 115-118 ◽

Author(s):

Yung Liou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Homoepitaxial diamond growth by high-power microwave-plasma chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2004.08.005 ◽

2004 ◽

Vol 271 (3-4) ◽

pp. 409-419 ◽

Author(s):

Tokuyuki Teraji ◽

Toshimichi Ito

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

High Power Microwave ◽

Plasma Chemical Vapor Deposition ◽

Power Microwave

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Roll-to-Roll Graphene Synthesis by Using Microwave Plasma Chemical Vapor Deposition at Low Temperature

MRS Proceedings ◽

10.1557/opl.2012.1299 ◽

2012 ◽

Vol 1401 ◽

Author(s):

Takatoshi Yamada ◽

Masatou Ishihara ◽

Jaeho Kim ◽

Masataka Hasegawa ◽

Sumio Iijima

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Graphene Film ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Graphene Synthesis ◽

ABSTRACTWe reported continuous depositions of grahene films on copper foils with A4 width using roll-to-toll microwave plasma chemical vapor deposition (MWPCVD) technique. A pair of winder and unwinder was built into an MWPCVD apparatus. Surface-wave plasma enabled us to deposit large-area graphene film (substrate stage is of 480 mm x 300 mm) at temperatures below 400 ºC. In Raman spectra, G- and G’-band attributed to graphene were obtained. In addition, Dand D’-band originated from defects and/or edges were detected. These results suggested that the obtained graphene films consisted of flake boundaries and defects. After the transferring graphene onto the polyethylene terephthalate film, uniform transmittance and sheet resistance were confirmed.

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Diamond growth on CoSi2/Si by bias-enhanced microwave plasma chemical vapor deposition method

Materials Chemistry and Physics ◽

10.1016/s0254-0584(01)00430-8 ◽

2001 ◽

Vol 72 (2) ◽

pp. 172-175 ◽

Author(s):

Mao Rong Chen ◽

Li Chang ◽

Der Fu Chang ◽

Hou Guang Chen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Parameter window of diamond growth on GaN films by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.02.011 ◽

2008 ◽

Vol 17 (7-10) ◽

pp. 1775-1779 ◽

Author(s):

Dipti Ranjan Mohapatra ◽

Padmnabh Rai ◽

Abha Misra ◽

Pawan K. Tyagi ◽

Brajesh S. Yadav ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Investigation of diamond growth at high pressure by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2003.11.034 ◽

2004 ◽

Vol 13 (4-8) ◽

pp. 604-609 ◽

Author(s):

V. Mortet ◽

A. Kromka ◽

R. Kravets ◽

J. Rosa ◽

V. Vorlicek ◽

...

Keyword(s):

High Pressure ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Textured diamond growth on (100) β‐SiC via microwave plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.106541 ◽

1992 ◽

Vol 60 (6) ◽

pp. 698-700 ◽

Author(s):

B. R. Stoner ◽

J. T. Glass

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Heteroepitaxial diamond growth on 4H-SiC using microwave plasma chemical vapor deposition

Heliyon ◽

10.1016/j.heliyon.2017.e00404 ◽

2017 ◽

Vol 3 (9) ◽

pp. e00404 ◽

Author(s):

Eric Moore ◽

Joshua Jarrell ◽

Lei Cao

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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