Roll-to-Roll Graphene Synthesis by Using Microwave Plasma Chemical Vapor Deposition at Low Temperature

ABSTRACTWe reported continuous depositions of grahene films on copper foils with A4 width using roll-to-toll microwave plasma chemical vapor deposition (MWPCVD) technique. A pair of winder and unwinder was built into an MWPCVD apparatus. Surface-wave plasma enabled us to deposit large-area graphene film (substrate stage is of 480 mm x 300 mm) at temperatures below 400 ºC. In Raman spectra, G- and G’-band attributed to graphene were obtained. In addition, Dand D’-band originated from defects and/or edges were detected. These results suggested that the obtained graphene films consisted of flake boundaries and defects. After the transferring graphene onto the polyethylene terephthalate film, uniform transmittance and sheet resistance were confirmed.

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A 915 MHz/75 kW cylindrical cavity type microwave plasma chemical vapor deposition reactor with a ladder-shaped circumferential antenna developed for growing large area diamond films

Diamond and Related Materials ◽

10.1016/j.diamond.2017.08.007 ◽

2017 ◽

Vol 78 ◽

pp. 67-72 ◽

Cited By ~ 7

Author(s):

Y.F. Li ◽

X.M. An ◽

X.C. Liu ◽

L. Jiang ◽

P.W. Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cylindrical Cavity ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Large Area ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition

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Graphene synthesis by microwave plasma chemical vapor deposition: analysis of the emission spectra and modeling

Plasma Sources Science and Technology ◽

10.1088/1361-6595/ab0b33 ◽

2019 ◽

Vol 28 (4) ◽

pp. 045001 ◽

Cited By ~ 5

Author(s):

K Pashova ◽

I Hinkov ◽

X Aubert ◽

S Prasanna ◽

F Bénédic ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Emission Spectra ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Graphene Synthesis

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Nucleation-enhancing treatment for diamond growth over a large-area using magnetoactive microwave plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1287411 ◽

2000 ◽

Vol 88 (5) ◽

pp. 2979-2983 ◽

Cited By ~ 3

Author(s):

Hyeongmin Jeon ◽

Chunlei Wang ◽

Akimitsu Hatta ◽

Toshimichi Ito

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Large Area ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Large area coating of graphene at low temperature using a roll-to-roll microwave plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2012.12.102 ◽

2013 ◽

Vol 532 ◽

pp. 89-93 ◽

Cited By ~ 33

Author(s):

Takatoshi Yamada ◽

Masatou Ishihara ◽

Masataka Hasegawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Large Area ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Roll To Roll

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HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON USING MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION PROCESS

Le Journal de Physique Colloques ◽

10.1051/jphyscol:1989578 ◽

1989 ◽

Vol 50 (C5) ◽

pp. C5-667-C5-672

Author(s):

DING-KUN PENG ◽

CHUN-LIN WANG ◽

GUANG-YAO MENG

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Self-Organized Microcones Grown on Si Substrate by Microwave Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.3050 ◽

2008 ◽

Vol 47 (4) ◽

pp. 3050-3052

Author(s):

Masataka Moriya ◽

Yuji Matsumoto ◽

Yoshinao Mizugaki ◽

Tadayuki Kobayashi ◽

Kouichi Usami

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Self Organized

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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Chinese Physics ◽

10.1088/1009-1963/9/7/015 ◽

2000 ◽

Vol 9 (7) ◽

pp. 545-549

Author(s):

Zhang Yong-ping ◽

Gu You-song ◽

Chang Xiang-rong ◽

Tian Zhong-zhuo ◽

Shi Dong-xia ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Lateral outward growth of single-crystal diamond by two different structures of microwave plasma reactors

CrystEngComm ◽

10.1039/d1ce01373d ◽

2022 ◽

Author(s):

Wei Cao ◽

Zhibin Ma ◽

Hongyang Zhao ◽

Deng Gao ◽

Qiuming Fu

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Lateral Growth ◽

Plasma Reactors ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Single Crystal Diamond

On a semi-open holder, the homoepitaxial lateral growth of single-crystal diamond (SCD) was carried out via microwave plasma chemical vapor deposition (MPCVD). By tuning and optimizing two different structures of...

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