Comparing Fourier optics and contrast transfer function modeling of image formation in low energy electron microscopy

2017 ◽  
Vol 183 ◽  
pp. 109-116 ◽  
Author(s):  
K.M. Yu ◽  
A. Locatelli ◽  
M.S. Altman
Keyword(s):  
Electron Microscopy ◽  
Transfer Function ◽  
Image Formation ◽  
Low Energy ◽  
Energy Electron ◽  
Fourier Optics ◽  
Contrast Transfer Function ◽  
Low Energy Electron

WAVE OPTICAL TREATMENT OF SURFACE STEP CONTRAST IN LOW-ENERGY ELECTRON MICROSCOPY

2009 ◽  
Vol 16 (06) ◽  
pp. 855-867 ◽  
Author(s):  
S. M. KENNEDY ◽  
N. E. SCHOFIELD ◽  
D. M. PAGANIN ◽  
D. E. JESSON
Keyword(s):  
Electron Microscopy ◽  
Transfer Function ◽  
Imaging System ◽  
Two Dimensions ◽  
Low Energy ◽  
Energy Electron ◽  
Surface Step ◽  
Optical Treatment ◽  
Low Energy Electron ◽  
Step Contrast

A wave optical treatment of surface step contrast in a low-energy electron microscopy (LEEM) is presented. The aberrations of an idealised LEEM imaging system are directly incorporated into a transfer function (TF) and image simulations of surface steps are evaluated in one and two dimensions. Under the special circumstances of a weak phase object, the simplified form of the contrast transfer function (CTF) is used to discuss LEEM image contrast and optimum defocus conditions.

The potential of the scanning low energy electron microscopy for the examination of aluminum based alloys and composites

Microscopy ◽  
2005 ◽  
Vol 54 (2) ◽  
pp. 109-117 ◽  
Author(s):  
Kenji Matsuda ◽  
Susumu Ikeno ◽  
Ilona Müllerová ◽  
Luděk Frank
Keyword(s):  
Electron Microscopy ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron

Spin Polarized Low Energy Electron Microscopy (Spleem) of Single and Combined Layers of Co, Cu, and Pd on W (110)

1993 ◽  
Vol 313 ◽  
Author(s):  
Helmut Poppa ◽  
Heiko Pinkvos ◽  
Karsten Wurm ◽  
Ernst Bauer
Keyword(s):  
Electron Microscopy ◽  
Band Structure ◽  
Film Growth ◽  
Magnetic Domain ◽  
Low Energy ◽  
Energy Electron ◽  
Magnetic Studies ◽  
Deposition Rates ◽  
Spin Polarized ◽  
Low Energy Electron

ABSTRACTIn-situ recording of ultra-thin film growth by Low Energy Electron Microscopy (LEEM) results in accurate determinations of monolayer metal deposition rates for difficult to calibrate deposition geometries. Deposition rates and growth features were determined for Cu and Co on W (110) allowing for thickness control at the submonolayer level. Also, the transparencies of non-Magnetic overlayers of Pd (111) and Cu (111) to very low energy spin polarized electrons were compared and qualitatively explained by band structure considerations. Cu (111) is much more transparent than Pd (111) so that magnetic domain structures can be observed through at least 4 nmof Cu (111). This suggests the use of Cu (111) and other metals of suitable band structure as protective layers for surface magnetic studies.

Tailoring Si(100) substrate surfaces for GaP growth by Ga deposition: A low-energy electron microscopy study

2015 ◽  
Vol 118 (5) ◽  
pp. 055701 ◽  
Author(s):  
Michael Rienäcker ◽  
Benjamin Borkenhagen ◽  
Gerhard Lilienkamp ◽  
Winfried Daum
Keyword(s):  
Electron Microscopy ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron ◽  
Substrate Surfaces
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