DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Substrate Bias ◽

Amorphous Carbon Films ◽

Thermal analysis of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapour deposition

Journal of Materials Science ◽

10.1007/bf00612418 ◽

1991 ◽

Vol 26 (17) ◽

pp. 4787-4794 ◽

Cited By ~ 9

Author(s):

M. H. Kim ◽

J. Y. Lee

Keyword(s):

Thermal Analysis ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

Thin Solid Films ◽

10.1016/s0040-6090(99)00536-2 ◽

1999 ◽

Vol 357 (2) ◽

pp. 246-253 ◽

Cited By ~ 35

Author(s):

D. Bourgoin ◽

S. Turgeon ◽

G.G. Ross

Keyword(s):

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition

Advances in Science and Technology - Diamond and Other New Carbon Materials IV ◽

10.4028/3-908158-04-4.17 ◽

2006 ◽

pp. 17-23

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agullo-Rueda ◽

C. Gómez-Aleixandre ◽

...

Keyword(s):

Physical Properties ◽

Bias Voltage ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Correlation between surface morphology and optical properties for different types of hydrogenated amorphous carbon films grown by plasma enhanced chemical vapour deposition

Solid State Communications ◽

10.1016/s0038-1098(98)00506-7 ◽

1998 ◽

Vol 109 (1) ◽

pp. 23-28 ◽

Cited By ~ 8

Author(s):

C. Maréchal ◽

A. Zeinert ◽

K. Zellama ◽

E. Lacaze ◽

M. Zarrabian ◽

...

Keyword(s):

Optical Properties ◽

Surface Morphology ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Different Types ◽

Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.03.017 ◽

2010 ◽

Vol 19 (7-9) ◽

pp. 1093-1102 ◽

Cited By ~ 32

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

R. Gago ◽

...

Keyword(s):

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Tribological Study ◽

Plasma Chemical Vapour Deposition ◽

Low temperature plasma-assisted chemical vapour deposition of amorphous carbon films for biomedical-polymeric substrates

Diamond and Related Materials ◽

10.1016/0925-9635(94)90035-3 ◽

1994 ◽

Vol 3 (1-2) ◽

pp. 83-87 ◽

Cited By ~ 39

Author(s):

I.R. McColl ◽

D.M. Grant ◽

S.M. Green ◽

J.V. Wood ◽

T.L. Parker ◽

...

Keyword(s):

Low Temperature ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Amorphous Carbon Films ◽

Polymeric Substrates

Effect of substrate bias in hydrogenated amorphous carbon films having embedded nanocrystallites deposited by cathodic jet carbon arc technique

Diamond and Related Materials ◽

10.1016/j.diamond.2012.02.010 ◽

2012 ◽

Vol 25 ◽

pp. 63-72 ◽

Cited By ~ 14

Author(s):

O.S. Panwar ◽

Ishpal ◽

R.K. Tripathi ◽

A.K. Srivastava ◽

Mahesh Kumar ◽

...

Keyword(s):

Amorphous Carbon ◽

Carbon Films ◽

Substrate Bias ◽

Amorphous Carbon Films ◽

Carbon Arc ◽

Properties of polymeric layers of hydrogenated amorphous carbon produced by a plasma-activated chemical vapour deposition process II: Tribological and mechanical properties

Thin Solid Films ◽

10.1016/0040-6090(86)90144-6 ◽

1986 ◽

Vol 143 (1) ◽

pp. 31-41 ◽

Cited By ~ 131

Author(s):

R. Memming ◽

H.J. Tolle ◽

P.E. Wierenga

Keyword(s):

Mechanical Properties ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Chemical Vapour Deposition Process ◽

Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/17/8/026 ◽

1984 ◽

Vol 17 (8) ◽

pp. 1727-1742 ◽

Cited By ~ 167

Author(s):

K Tachibana ◽

M Nishida ◽

H Harima ◽

Y Urano

Keyword(s):

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films

Plasma Enhanced-Chemical Vapour Deposition of Scuff-Resistant Hydrogenated Amorphous Carbon Coatings on C100 Steel

Journal of Surface Engineered Materials and Advanced Technology ◽

10.4236/jsemat.2014.43017 ◽

2014 ◽

Vol 04 (03) ◽

pp. 131-139

Author(s):

Nicoletta De Vietro ◽

Gianluigi Intonti ◽

Francesco Fracassi ◽

Gianluca Quarta ◽

Lucio Maruccio ◽

...

Keyword(s):

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Coatings ◽

Amorphous Carbon Coatings ◽