Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/17/8/026 ◽

1984 ◽

Vol 17 (8) ◽

pp. 1727-1742 ◽

Author(s):

K Tachibana ◽

M Nishida ◽

H Harima ◽

Y Urano

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films

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Low temperature plasma-assisted chemical vapour deposition of amorphous carbon films for biomedical-polymeric substrates

Diamond and Related Materials ◽

10.1016/0925-9635(94)90035-3 ◽

1994 ◽

Vol 3 (1-2) ◽

pp. 83-87 ◽

Author(s):

I.R. McColl ◽

D.M. Grant ◽

S.M. Green ◽

J.V. Wood ◽

T.L. Parker ◽

...

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Low Temperature Plasma ◽

Temperature Plasma ◽

Amorphous Carbon Films ◽

Polymeric Substrates

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Correlation between surface morphology and optical properties for different types of hydrogenated amorphous carbon films grown by plasma enhanced chemical vapour deposition

Solid State Communications ◽

10.1016/s0038-1098(98)00506-7 ◽

1998 ◽

Vol 109 (1) ◽

pp. 23-28 ◽

Author(s):

C. Maréchal ◽

A. Zeinert ◽

K. Zellama ◽

E. Lacaze ◽

M. Zarrabian ◽

...

Keyword(s):

Optical Properties ◽

Surface Morphology ◽

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Different Types ◽

Hydrogenated Amorphous

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Thermal analysis of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapour deposition

Journal of Materials Science ◽

10.1007/bf00612418 ◽

1991 ◽

Vol 26 (17) ◽

pp. 4787-4794 ◽

Author(s):

M. H. Kim ◽

J. Y. Lee

Keyword(s):

Thermal Analysis ◽

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Tribological study of hydrogenated amorphous carbon films with tailored microstructure and composition produced by bias-enhanced plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2010.03.017 ◽

2010 ◽

Vol 19 (7-9) ◽

pp. 1093-1102 ◽

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

R. Gago ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Tribological Study ◽

Plasma Chemical Vapour Deposition ◽

Hydrogenated Amorphous

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Characterization of hydrogenated amorphous carbon films produced by plasma-enhanced chemical vapour deposition with various chemical hybridizations

Thin Solid Films ◽

10.1016/s0040-6090(99)00536-2 ◽

1999 ◽

Vol 357 (2) ◽

pp. 246-253 ◽

Author(s):

D. Bourgoin ◽

S. Turgeon ◽

G.G. Ross

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Effect of mixing oxygen or diborane on the formation of amorphous carbon films from methane by r.f. plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(88)90427-0 ◽

1988 ◽

Vol 163 ◽

pp. 229-232 ◽

Author(s):

C.R. Aiyer ◽

S.A. Gangal ◽

K. Montasser ◽

S. Morita ◽

S. Hattori

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapour Deposition

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DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition

Vacuum ◽

10.1016/j.vacuum.2007.04.021 ◽

2007 ◽

Vol 81 (11-12) ◽

pp. 1412-1415 ◽

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agulló-Rueda ◽

C. Gómez-Aleixandre ◽

...

Keyword(s):

Physical Properties ◽

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Substrate Bias ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Effect of Bias Voltage on the Physical Properties of Hydrogenated Amorphous Carbon Films Grown by Electron Cyclotron Resonance Chemical Vapour Deposition

Advances in Science and Technology - Diamond and Other New Carbon Materials IV ◽

10.4028/3-908158-04-4.17 ◽

2006 ◽

pp. 17-23

Author(s):

J.G. Buijnsters ◽

M. Camero ◽

L. Vázquez ◽

F. Agullo-Rueda ◽

C. Gómez-Aleixandre ◽

...

Keyword(s):

Physical Properties ◽

Chemical Vapour Deposition ◽

Bias Voltage ◽

Amorphous Carbon ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapour ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous

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Remote Microwave Plasma Enhanced Chemical Vapour Deposition of Amorphous Carbon : Optical Emission Spectroscopy Characterisation of the Afterglow and Growth Rates

Journal de Physique IV (Proceedings) ◽

10.1051/jphyscol:1995570 ◽

1995 ◽

Vol 05 (C5) ◽

pp. C5-593-C5-600 ◽

Author(s):

C. Tixier ◽

P. Tristant ◽

J. Desmaison ◽

D. Merle

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Growth Rates ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission

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Study of barrier properties and chemical resistance of recycled PET coated with amorphous carbon through a plasma enhanced chemical vapour deposition (PECVD) process

Food Additives & Contaminants ◽

10.1080/02652030500384064 ◽

2006 ◽

Vol 23 (1) ◽

pp. 100-106 ◽

Author(s):

S. A. Cruz ◽

M. Zanin ◽

C. Nerin ◽

M. A. B. De Moraes

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Vapour Deposition ◽

Chemical Resistance ◽

Chemical Vapour ◽

Barrier Properties ◽

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