Etching characteristics of Al2O3 thin films in inductively coupled BCl3/Ar plasma
2004 ◽
Vol 22
(5)
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pp. 2101-2106
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2003 ◽
Vol 21
(6)
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pp. 1837-1842
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2003 ◽
Vol 4
(3)
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pp. 1-4
Keyword(s):
2008 ◽
Vol 14
(3)
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pp. 297-302
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Keyword(s):
2002 ◽
Vol 15
(12)
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pp. 1011-1015
2008 ◽
Vol 85
(2)
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pp. 348-354
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