Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma

Vacuum ◽  
2020 ◽  
Vol 181 ◽  
pp. 109421
Author(s):  
Moon Hwan Cha ◽  
Eun Taek Lim ◽  
Sung Yong Park ◽  
Ji Su Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma

2008 ◽  
Vol 14 (3) ◽  
pp. 297-302 ◽  
Author(s):  
Su Ryun Min ◽  
Han Na Cho ◽  
Yue Long Li ◽  
Sung Keun Lim ◽  
Seung Pil Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Inductively Coupled Plasma Reactive Ion Etching of GeSbTe Thin Films in a HBr/Ar Gas

2007 ◽  
Vol 90 (1) ◽  
pp. 95-106 ◽  
Author(s):  
JANG WOO LEE ◽  
HAN NA CHO ◽  
SU RYUN MIN ◽  
CHEE WON CHUNG
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Gas

Inductively coupled plasma-reactive ion etching of InSb using CH4∕H2∕Ar plasma

2009 ◽  
Vol 27 (4) ◽  
pp. 681-685 ◽  
Author(s):  
Guo-Dong Zhang ◽  
Wei-Guo Sun ◽  
Shu-Li Xu ◽  
Hong-Yan Zhao ◽  
Hong-Yi Su ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma
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