Etching mechanism of MgO thin films in inductively coupled Cl2∕Ar plasma

2004 ◽  
Vol 22 (5) ◽  
pp. 2101-2106 ◽  
Author(s):  
A. M. Efremov ◽  
Seong-Mo Koo ◽  
Dong-Pyo Kim ◽  
Kyoung-Tae Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Etching Mechanism ◽  
Ar Plasma

On the etching mechanism of ZrO2 thin films in inductively coupled BCl3/Ar plasma

2008 ◽  
Vol 85 (2) ◽  
pp. 348-354 ◽  
Author(s):  
Mansu Kim ◽  
Nam-Ki Min ◽  
Sun Jin Yun ◽  
Hyun Woo Lee ◽  
Alexander Efremov ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Etching Mechanism ◽  
Ar Plasma

Etching mechanism of (Pb,Sr)TiO3 thin films for DRAM application using Cl2/Ar inductively coupled plasma

Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 485-489 ◽  
Author(s):  
Gwan-Ha Kim ◽  
Kyoung-Tae Kim ◽  
Dong-Pyo Kim ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled ◽  
Etching Mechanism

Etching properties of Na0.5K0.5NbO3 thin films by using inductively coupled CF4/Ar plasma

2014 ◽  
Vol 114 ◽  
pp. 1-6 ◽  
Author(s):  
Young-Hee Joo ◽  
Jong-Chang Woo ◽  
Chang-Il Kim
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Ar Plasma

Etching characteristics of Al2O3 thin films in inductively coupled BCl3/Ar plasma

Vacuum ◽  
2008 ◽  
Vol 82 (11) ◽  
pp. 1198-1202 ◽  
Author(s):  
Sun Jin Yun ◽  
Alexander Efremov ◽  
Mansu Kim ◽  
Dae-Won Kim ◽  
Jung Wook Lim ◽  
...  
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Ar Plasma

HfO2 etching mechanism in inductively-coupled Cl2/Ar plasma

2011 ◽  
Vol 519 (20) ◽  
pp. 6708-6711 ◽  
Author(s):  
Moonkeun Kim ◽  
Alexander Efremov ◽  
Hyun Woo Lee ◽  
Hyung-Ho Park ◽  
MunPyo Hong ◽  
...  
Keyword(s):  
Inductively Coupled ◽  
Etching Mechanism ◽  
Ar Plasma

Inductively coupled plasma reactive ion etching of copper thin films using ethylenediamine/butanol/Ar plasma

Vacuum ◽  
2020 ◽  
Vol 181 ◽  
pp. 109421
Author(s):  
Moon Hwan Cha ◽  
Eun Taek Lim ◽  
Sung Yong Park ◽  
Ji Su Lee ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Inductively Coupled Plasma ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Inductively Coupled ◽  
Ar Plasma

Etching characteristics and mechanism of ZnO thin films in inductively coupled HBr/Ar plasma

2009 ◽  
Vol 517 (14) ◽  
pp. 4242-4245 ◽  
Author(s):  
Yong-Hyun Ham ◽  
Alexander Efremov ◽  
Sun Jin Yun ◽  
Jun Kwan Kim ◽  
Nam-Ki Min ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Inductively Coupled ◽  
Ar Plasma
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