Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane

2001 ◽  
Vol 32 (9) ◽  
pp. 783-786 ◽  
Author(s):  
Marco A.R. Alves ◽  
Jônatas F. Rossetto ◽  
Olga Balachova ◽  
Edmundo da Silva Braga ◽  
Lucila Cescato
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Carbon Thin Films ◽  
Amorphous Hydrogenated Carbon

Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation

2006 ◽  
Vol 200 (22-23) ◽  
pp. 6405-6408 ◽  
Author(s):  
Peter C.T. Ha ◽  
D.R. McKenzie ◽  
M.M.M. Bilek ◽  
E.D. Doyle ◽  
D.G. McCulloch ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Carbon Thin Films ◽  
Cathodic Arc

Optical properties of amorphous carbon thin films prepared by plasma deposition in a graphite hollow cathode

1992 ◽  
Vol 220 (1-2) ◽  
pp. 125-131 ◽  
Author(s):  
Juan Manuel Mendez ◽  
Stephen Muhl ◽  
G. Contreras-Puente ◽  
J. Aguilar-Hernandez
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Amorphous Carbon ◽  
Hollow Cathode ◽  
Plasma Deposition ◽  
Carbon Thin Films

RF-Plasma Deposition Of Hydrogenated Hard Carbon Thin Films

1983 ◽  
Author(s):  
A. Bubenzer ◽  
B. Dischler ◽  
G. Brandt ◽  
P. Koidl
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Hard Carbon ◽  
Carbon Thin Films

Optical properties of amorphous hydrogenated carbon thin films

2001 ◽  
Vol 281 (1-3) ◽  
pp. 171-180 ◽  
Author(s):  
R. Bouzerar ◽  
C. Amory ◽  
A. Zeinert ◽  
M. Benlahsen ◽  
B. Racine ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Carbon Thin Films ◽  
Amorphous Hydrogenated Carbon

Hardness Measurements on Anode and Cathode Mounted, Plasma Deposited Amorphous Hydrogenated Carbon

1994 ◽  
Vol 349 ◽  
Author(s):  
Shu-Han Lin ◽  
Bernard J. Feldman ◽  
Dong Li ◽  
Yip-Wah Chung ◽  
Mingshow Wong ◽  
...  
Keyword(s):  
Thin Films ◽  
Hydrogen Concentration ◽  
Plasma Deposition ◽  
Ion Bombardment ◽  
Optical Bandgap ◽  
Carbon Thin Films ◽  
Amorphous Hydrogenated Carbon

ABSTRACTWe have measured the microhardness of various amorphous hydrogenated carbon thin films that were grown on both the anode and the cathode of our plasma deposition system. We observe no difference in microhardness between films with the same optical bandgap, whether grown on the cathode or on the anode. We conclude that the ion bombardment during cathode growth does not contribute to the hardness of the films. In contrast, we observe a large variation in microhardness as a function of optical bandgap. We conclude that it is increasing hydrogen concentration, found primarily in the clusters and not in the crosslinks, that decreases the hardness of our films. Finally, we observe that the addition of nitrogen to our films does not change the microhardness; again, the hardness is primarily determined by the hydrogen concentration.

The Interaction of CdSe/ZnS Quantum Dot with Plasmonic Ag Nanoparticles Deposited on Amorphous Hydrogenated Carbon Thin Films

2018 ◽  
Vol 125 (5) ◽  
pp. 731-734 ◽  
Author(s):  
D. Khmelevskaya ◽  
D. P. Shcherbinin ◽  
E. A. Konshina ◽  
M. M. Abboud ◽  
A. Dubavik ◽  
...  
Keyword(s):  
Thin Films ◽  
Quantum Dot ◽  
Ag Nanoparticles ◽  
Carbon Thin Films ◽  
Amorphous Hydrogenated Carbon

rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications

1983 ◽  
Vol 54 (8) ◽  
pp. 4590-4595 ◽  
Author(s):  
A. Bubenzer ◽  
B. Dischler ◽  
G. Brandt ◽  
P. Koidl
Keyword(s):  
Thin Films ◽  
Rf Plasma ◽  
Hard Carbon ◽  
Carbon Thin Films

Understanding terahertz optical properties of amorphous carbon thin films

Carbon ◽  
2013 ◽  
Vol 64 ◽  
pp. 67-71 ◽  
Author(s):  
H. Wang ◽  
J.Q. Guo ◽  
Y.S. Zhou
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Amorphous Carbon ◽  
Carbon Thin Films
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