Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation

2006 ◽  
Vol 200 (22-23) ◽  
pp. 6405-6408 ◽  
Author(s):  
Peter C.T. Ha ◽  
D.R. McKenzie ◽  
M.M.M. Bilek ◽  
E.D. Doyle ◽  
D.G. McCulloch ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Carbon Thin Films ◽  
Cathodic Arc

Some optical properties of amorphous hydrogenated carbon thin films prepared by rf plasma deposition using methane

2001 ◽  
Vol 32 (9) ◽  
pp. 783-786 ◽  
Author(s):  
Marco A.R. Alves ◽  
Jônatas F. Rossetto ◽  
Olga Balachova ◽  
Edmundo da Silva Braga ◽  
Lucila Cescato
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Carbon Thin Films ◽  
Amorphous Hydrogenated Carbon

RF-Plasma Deposition Of Hydrogenated Hard Carbon Thin Films

1983 ◽  
Author(s):  
A. Bubenzer ◽  
B. Dischler ◽  
G. Brandt ◽  
P. Koidl
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Hard Carbon ◽  
Carbon Thin Films

rf‐plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applications

1983 ◽  
Vol 54 (8) ◽  
pp. 4590-4595 ◽  
Author(s):  
A. Bubenzer ◽  
B. Dischler ◽  
G. Brandt ◽  
P. Koidl
Keyword(s):  
Thin Films ◽  
Rf Plasma ◽  
Hard Carbon ◽  
Carbon Thin Films

Effect of RF plasma deposition parameters on Y1Ba2Cu3O7−x thin films

1991 ◽  
Author(s):  
A. Shah ◽  
E. Narumi ◽  
J. Schutkeker ◽  
S. Patel ◽  
D. T. Shaw
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Rf Plasma ◽  
Deposition Parameters

Deposition of superhard TiAlSiN thin films by cathodic arc plasma deposition

2005 ◽  
Vol 200 (5-6) ◽  
pp. 1391-1394 ◽  
Author(s):  
S.K. Kim ◽  
P.V. Vinh ◽  
J.H. Kim ◽  
T. Ngoc
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Arc Plasma ◽  
Cathodic Arc
Sign in / Sign up

Export Citation Format

Share Document