Comparison of growth of hydrocarbon thin films by molecular-beam and cluster-beam deposition: atomistic simulations

2001 ◽  
Vol 381 (1) ◽  
pp. 73-83 ◽  
Author(s):  
Thomas A Plaisted ◽  
Boris Ni ◽  
John D Zahrt ◽  
Susan B Sinnott
Keyword(s):  
Thin Films ◽  
Molecular Beam ◽  
Atomistic Simulations ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Ionized‐cluster‐beam deposition and electrical bistability of C60–tetracyanoquinodimethane thin films

1996 ◽  
Vol 68 (16) ◽  
pp. 2192-2194 ◽  
Author(s):  
H. J. Gao ◽  
Z. Q. Xue ◽  
K. Z. Wang ◽  
Q. D. Wu ◽  
S. Pang
Keyword(s):  
Thin Films ◽  
Cluster Beam ◽  
Electrical Bistability ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Supersonic Cluster Beam Synthesis of Nanophase Materials

1999 ◽  
Vol 581 ◽  
Author(s):  
P. Milanil ◽  
S. Iannotta ◽  
F. Biasioli ◽  
P. Piseri ◽  
E. Barborini
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Tini Alloy ◽  
Cluster Beam ◽  
Crystallite Sizes ◽  
Nanophase Materials ◽  
Cluster Beams ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTWe present the characterization of supersonic cluster beam deposition as a viable technique for the synthesis of nanostructured materials. Stable and intense cluster beams can be obtained with a pulsed microplasma cluster source. This technique has been applied to produce TiNi nanostructured thin films on various substrates at room temperature. The morphology and the structure of the film are strongly influenced by the precursor clusters. Films characterized by crystallite sizes of a few tens of nanometers can be grown without recrystallization by thermal annealing. The stoichiometry of the original TiNi alloy is maintained.

Properties of ZnS Thin-Films Grown by Ionized-Cluster Beam Deposition

1982 ◽  
Vol 21 (Part 2, No. 9) ◽  
pp. L551-L552 ◽  
Author(s):  
Yasushi Ohkawa ◽  
Ken'ichi Oki ◽  
Masayuki Wakitani ◽  
Shoshin Miura ◽  
Shozo Umeda
Keyword(s):  
Thin Films ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Fabrication of AIN thin films by reactive ionized cluster beam deposition technique

Vacuum ◽  
1990 ◽  
Vol 41 (7-9) ◽  
pp. 1971-1973 ◽  
Author(s):  
M. Koshinaka ◽  
H. Fujii ◽  
K. Nakanishi ◽  
Y. Shibuya
Keyword(s):  
Thin Films ◽  
Cluster Beam ◽  
Deposition Technique ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Cluster Beam Deposition for Optical Thin Films

2009 ◽  
pp. 309-309-11
Author(s):  
EM Waddell ◽  
BC Monachan ◽  
KL Lewis ◽  
T Wyatt-Davies ◽  
AM Pitt
Keyword(s):  
Thin Films ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

CORRELATION BETWEEN FREE-CLUSTER PROPERTIES AND THIN FILMS ELABORATED BY LOW-ENERGY CLUSTER-BEAM DEPOSITION

1996 ◽  
Vol 03 (01) ◽  
pp. 1007-1011
Author(s):  
P. MÉLINON ◽  
V. PAILLARD ◽  
V. DUPUIS ◽  
J.P. PEREZ ◽  
J. TUAILLON ◽  
...  
Keyword(s):  
Thin Films ◽  
Carbon Cluster ◽  
Carbon Films ◽  
Low Energy ◽  
Cluster Beam ◽  
Free Cluster ◽  
Cluster Properties ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Beam Deposition

The properties of thin films obtained by low-energy cluster-beam deposition are reviewed. The main characteristics are the nanoscale granular structure and the memory effect of the free-cluster properties. The first point is evidenced by the specific magnetic properties of transition-metal films, which are intermediate between amorphous and bulk phases, while the second point is illustrated from carbon films exhibiting the electronic structure of the free carbon cluster.

Sign in / Sign up

Export Citation Format

Share Document